Documentos de Académico
Documentos de Profesional
Documentos de Cultura
Proyecto 6 Sigma
Cajuela CD 338
(Altura en Z)
Donde:
MG-2582-1 Realiza el ensamble de Buje y parte 1 y 2
MG-2582-2 Realiza el embujado y remachado parte carrocera
MG-0051: Ensamble final de la cajuela
MG-051/1
MG-2582-1
MG-2582-2
5 PERSONAS / TURNO
MG-2582-2 Coloca buje y ensambla parte carrocera as como la colocacin en forma manual del tope amortiguador
y guardapolvo; tiene una capacidad de 287 pz/hr al 100% de eficiencia y es operada por 1 persona; es una maquina
de plato circular con 6 nidos ( fases ) para el proceso
MG-051/1 Realiza el ensamble final de la cajuela con una capacidad de 190 pz/hr al 100% de eficiencia con 1
persona operndola; es una prensa en la cual se colocan todos los sub ensambles y con una fuerza de Realiza el
remachado final logrando as el ensamble final
MAPEO PROCESO
ENSAMBLE DE BUJE EN
PARTE 1
INSPECCION RECIBO
ENSAMBLE DE TOPE Y
PERNO ESFERICO EN
PARTE CAJUELA
INSPECCION RECIBO
ENSAMBLE DE BUJE EN
PARTE 2
INSPECCION RECIBO
ENSAMBLE DE
GUARDAPOLVO EN
PARTE CARROCERIA
INSPECCION RECIBO
ENSAMBLE FINAL DE
BISAGRA CAJUELA
INSPECCION DE ALTURA
Z EN GAGE
ENSAMBLE DE BUJE Y
PERNO ESFERICO EN
PARTE CARROCERIA
CLIENTE
INSPECCION RECIBO
Parte carrocera
Perno escalonado
Perno esfrico
Buje
Parte 1
Parte 2
Arandela
Tope amortiguador
Parte cajuela
Especificacin
47.78 +/- 1 mm
Forma de medicin
Gage LV00046-MEX
LV618059-2
47.78 1 mm
PPM 10,384
6485
DEFECTO
SEM 1
Altura z baja
3701
Altura z alta
1542
No localiza perno en gage 1388
Cajuela floja pernos
5860
Con mov. Axial
16037
PRODUCC.
9535
SEM 2
5663
6922
1783
5873
105
10164
SEM 3
29024
21350
4919
2066
2656
11483
SEM 4
9144
23948
1655
3135
1568
11441
SEM 5
5944
24124
3671
3758
87
6362
SEM 6
62873
11003
36781
4244
2515
8747
SEM 7
8003
2515
1486
1143
457
El no cumplimiento con los requerimientos del cliente que especifican una altura en el eje Z de 47.78 +/- 1 mm. Y que
obliga a la lnea a realizar retrabajos que afectan a al productividad del proceso y a si ves afectan a lograr las metas de
calidad y entregas al cliente.
Nombre
J. Zamarrn
Gerente de produccin
H. Nabor
Ingeniero de manufactura
C. A. Morales
Ingeniero de manufactura
A. Soto
Supervisor de produccin
Mantenimiento
D. Rodrguez
Calidad
A. Rodrguez
E. Salazar
G. Ruiz
Ingeniera
A. Rodrguez
Puesto
J. Noyola
Gerente de mantenimiento
Gerente de Calidad
Ingeniero de Calidad
Metrlogo
Gerente IPP
Definicin de Variables
La salida del sistema (Y) ser el cumplimiento de la especificacin que marca el dibujo en altura en el eje Z (47.78 +/- 1
mm.)
Variables continuas
Y1 Altura en Z
X1. Dimetro de embujado parte Carrocera
X2. Espesor de embujado parte Carrocera
X3. Dimetro de embujado parte 1
X4. Espesor de embujado parte 1
X5. Dimetro de embujado parte 2
X6. Espesor de embujado parte 2
X7. Altura de hombro de perno escalonado
X8. Ancho de hombro de perno escalonado
X9. Distancia entre centros parte Carrocera
X10. Distancia entre centros parte 2
X11. Grado de deformacin parte 1 (0 5)
USL
P rocess D ata
LS L
-1.00000
Target
*
USL
1.00000
S ample M ean
-1.27810
S ample N
100
S tD ev (Within)
0.58505
S tD ev (O v erall)
0.56509
Within
Ov erall
P otential (Within) C apability
Cp
0.66
C PL
-0.18
C PU
1.51
C pk
-0.18
C C pk 0.66
O v erall C apability
Pp
PPL
PPU
P pk
C pm
-2.25
O bserv ed P erformance
P P M < LS L
910000.00
PPM > USL
40000.00
P P M Total
950000.00
E xp.
PPM
PPM
PPM
-1.50
Within P erformance
< LS L 682728.21
> USL
49.34
Total
682777.55
-0.75
0.00
0.75
1.50
0.69
-0.19
1.57
-0.19
*
-1.5
-1.0
-0.5
0.0
0.5
1.0
1.5
25.98
0.005
M ean
S tDev
V ariance
S kew ness
Kurtosis
N
-1.2781
0.5637
0.3177
4.0112
15.6872
100
-1.2
M inimum
1st Q uartile
M edian
3rd Q uartile
M aximum
-1.7300
-1.4600
-1.4400
-1.4100
1.4700
1.0
Mean
-1.8
LCL=-2.063
2
-1.40
-1.35
-1.30
-1.25
-1.20
-1.15
12
14
16
18
20
_
S=0.550
0.5
0.0
LCL=0
2
10
12
Subgroup
P otential ( ST ) C apability
0.6548
P rocess Tolerance
-1.75516
14
16
18
20
1.75516
S pecifications
-1.45
10
UCL=1.149
-1
Median
M ean
S tDev
Z.U S L
Z.LS L
Z.Bench
Z.S hift
P .U S L
P .LS L
P .Total
Yield
DPMO
Cp
C pk
C C pk
Pp
P pk
-1.4200
_
_
X=-1.278
-1.1663
C apability Indices
UCL=-0.493
-0.6
-2.97338
0.417177
-1
S pecifications
Data S ource:
Time S pan:
Data Trace:
ST
LT
0
0.585
1.71
1.71
1.36
1.85
0.0437026
0.0437026
0.0874053
91.26
87405.3
0.57
-0.16
0.57
*
*
-1.2781
0.565
4.03
-0.49
-0.49
1.85
0.0000277
0.688687
0.688715
31.13
688714.7
*
*
*
0.59
-0.16
-0.75
-1.50
1.50
0.75
0.00
P otential (S T)
A ctual (LT)
Date:
Reported by :
P roject:
Department:
P rocess:
C haracteristic:
U nits:
U pper S pec:
Low er S pec:
N ominal:
O pportunity :
1000000
10000
100
1
26/03/07
J. N oy ola
A ltura Z C D-338
P roduccion
C ajuela C D 338
A ltura en Z
Pz
1
-1
Process Benchmarks
S igma
(Z.Bench)
DP M O
10
12
14
16
18
20
A ctual (LT)
P otential (S T)
-0.49
1.36
2.0
Zshift
CONTROL
LS L
-2.25
2.5
Process Demographics
Process Performance
87405.3
1.5
1.0
0.5
BUENA
POBRE
688714.7
Zst
5 6
BUENA
TECNOLOGIA
A: Control pobre tecnologa inadecuada
B: Se debe controlar mejor el proceso, la tecnologa es inaceptable.
C: Buen control del proceso, tecnologa inadecuada
D: Clase mundial
USL
P rocess D ata
LS L
10.45000
Target
*
USL
10.60000
S ample M ean
10.44844
S ample N
45
S tD ev (Within)
0.06026
S tD ev (O v erall)
0.05807
Within
Ov erall
P otential (Within) C apability
Cp
0.48
C PL
-0.01
C PU
0.98
C pk
-0.01
C C pk 0.48
O v erall C apability
Pp
PPL
PPU
P pk
C pm
E xp.
PPM
PPM
PPM
Within P erformance
< LS L
510296.59
> USL
5953.58
Total
516250.17
0.50
-0.01
1.01
-0.01
*
10.35
10.40
10.45
10.50
10.55
10.60
A -S quared
P -V alue <
1.74
0.005
10.7
M ean
S tDev
V ariance
S kew ness
Kurtosis
N
10.448
0.058
0.003
1.59028
4.35508
45
10.5
M inimum
1st Q uartile
M edian
3rd Q uartile
M aximum
10.65
10.345
10.420
10.435
10.470
10.670
_
X=10.4484
10.3
LCL=10.2706
4
16
20
24
28
32
LCL=0
4
12
16
20
24
28
Observation
P otential ( ST ) C apability
32
40
P rocess Tolerance
10.2742
0.073
10.6227
10.6
10.45
S pecifications
S pecifications
10.47
Individual V alue
10.7
10.6
U B=10.6
_
X=10.525
10.5
LB=10.45
10.4
1
10.3
4
12
M oving Range
16
0.24
20
24
O bser vation
28
32
36
40
44
U C L=0.2185
0.18
0.12
__
M R=0.0669
0.06
0.00
LC L=0
4
12
44
P rocess Tolerance
Median
10.46
36
M ean
S tDev
Z.U S L
Z.LS L
Z.Bench
Z.S hift
P .U S L
P .LS L
P .Total
Yield
DPMO
Cp
C pk
C C pk
Pp
P pk
10.445
0.048
10.45
44
0.0
10.45
10.44
40
__
MR=0.0669
Mean
10.43
36
UCL=0.2185
10.466
10.425
10.42
12
0.1
0.2
C apability Indices
UCL=10.6263
16
20
24
O bser vation
28
32
36
40
44
10.6
Data S ource:
Time S pan:
Data Trace:
ST
LT
10.525
*
*
*
1.46
1.50
*
*
0.0718911
92.81
71891.1
*
*
*
*
*
10.4484
0.058
2.61
-0.03
-0.04
1.50
0.0045310
0.510685
0.515216
48.48
515215.7
*
*
*
0.43
-0.01
10.40
10.50
10.45
10.55
10.60
D ate:
Reported by :
P roject:
D epartment:
P rocess:
C haracteristic:
U nits:
U pper S pec:
Low er S pec:
N ominal:
O pportunity :
10.65
A ctual (LT)
26/03/07
J. N oy ola
A ltura Z C ajuela C D 338
P roduccion
C ajuela C D 338
Diametro de E nbujado
C ajuela
10.6
10.45
1000000
Process Benchmarks
100000
10000
1000
S igma
(Z.Bench)
100
A ctual (LT)
P otential (S T)
-0.04
1.46
DP M O
1
10
15
20
25
30
35
40
45
Zshift
515215.7
71891.1
1.5
1.0
0.5
BUENA
POBRE
10
1
2.0
CONTROL
LS L
10.35
2.5
Process Demographics
Process Performance
Zst
5 6
BUENA
TECNOLOGIA
A: Control pobre tecnologa inadecuada
B: Se debe controlar mejor el proceso, la tecnologa es inaceptable.
C: Buen control del proceso, tecnologa inadecuada
D: Clase mundial
USL
P rocess D ata
LS L
5.80000
Target
*
USL
6.10000
S ample M ean
5.92444
S ample N
45
S tD ev (Within)
0.04672
S tD ev (O v erall) 0.04616
Within
Ov erall
P otential (Within) C apability
Cp
1.25
C PL
1.03
C PU
1.46
C pk
1.03
C C pk 1.25
O v erall C apability
Pp
PPL
PPU
P pk
C pm
5.80
O bserv ed P erformance
P P M < LS L 0.00
P P M > U S L 0.00
P P M Total
0.00
5.85
5.90
5.95
6.00
6.05
6.10
1.26
1.05
1.48
1.05
*
Individual V alue
U C L=6.0818
C apability Indices
UCL=6.0562
6.05
6.0
_
X=5.9244
6.00
5.9
_
X=5.95
5.95
5.8
5.90
LCL=5.7927
4
12
16
20
24
28
32
36
40
44
0.2
5.85
UCL=0.1619
LC L=5.8182
4
12
16
20
24
O bser vation
28
32
40
44
0.1
__
MR=0.0495
0.0
0.20
M oving Range
36
LCL=0
12
16
20
24
28
Observation
U C L=0.1619
0.15
P otential ( ST ) C apability
0.10
32
5.8
LC L=0
4
12
16
20
24
O bser vation
28
32
36
40
6.1
S pecifications
6.06294
5.8
6.1
S pecifications
44
5.85
5.90
5.95
A -S quared
P -V alue
0.36
0.438
M ean
S tD ev
V ariance
S kew ness
Kurtosis
N
5.9244
0.0459
0.0021
0.068830
-0.404676
45
M inimum
1st Q uartile
M edian
3rd Q uartile
M aximum
6.00
5.8200
5.8900
5.9200
5.9650
6.0200
5.9382
Mean
Median
5.910
5.915
5.920
5.925
5.930
5.9346
5.935
5.940
44
P rocess Tolerance
5.78595
__
M R=0.0495
0.00
40
P rocess Tolerance
0.05
36
M ean
S tDev
Z.U S L
Z.LS L
Z.Bench
Z.S hift
P .U S L
P .LS L
P .Total
Yield
DPMO
Cp
C pk
C C pk
Pp
P pk
0.0580
Data S ource:
Time S pan:
Data Trace:
ST
LT
5.95
*
*
*
4.19
1.50
*
*
0.0000140
100.00
14.0
*
*
*
*
*
5.92444
0.046
3.80
2.70
2.69
1.50
0.0000715
0.0035122
0.0035838
99.64
3583.8
*
*
*
1.08
0.90
POBRE
Process Demographics
2.5
USL
5.80
5.85
5.90
5.95
6.00
6.05
6.10
A ctual (LT)
D ate:
Reported by :
P roject:
D epartment:
P rocess:
C haracteristic:
U nits:
U pper S pec:
Low er S pec:
N ominal:
O pportunity :
1000000
10000
100
1
26/03/07
J. N oy ola
A ltura Z C ajuela C D 338
P roduccion
C ajuela C D 338
E spesor de E nbujado
C ajuela
6.1
5.8
Process Benchmarks
S igma
(Z.Bench)
A ctual (LT)
P otential (S T)
2.69
4.19
2.0
Zshift
CONTROL
LS L
1.0
10
15
20
25
30
35
40
45
14.0
0.5
BUENA
3583.8
1.5
POBRE
DP M O
Zst
5 6
BUENA
TECNOLOGIA
A: Control pobre tecnologa inadecuada
B: Se debe controlar mejor el proceso, la tecnologa es inaceptable.
C: Buen control del proceso, tecnologa inadecuada
D: Clase mundial
USL
P rocess D ata
LS L
10.45000
Target
*
USL
10.60000
S ample M ean
10.49520
S ample N
50
S tD ev (Within)
0.04087
S tD ev (O v erall)
0.06123
Within
Ov erall
P otential (Within) C apability
Cp
0.71
C PL
0.43
C PU
1.00
C pk
0.43
C C pk 0.71
O v erall C apability
Pp
PPL
PPU
P pk
C pm
10.32
O bserv ed P erformance
P P M < LS L
200000.00
PPM > USL
20000.00
P P M Total
220000.00
E xp.
PPM
PPM
PPM
10.40
Within P erformance
< LS L
134403.34
> USL
5174.80
Total
139578.14
10.48
10.56
10.64
0.48
0.29
0.66
0.29
*
Individual V alue
10.6
10.5
6.15
_
X=10.525
6.00
LB=10.45
5.85
C apability Indices
UCL=6.1089
_
_
X=5.9412
LCL=5.7735
10.4
10
0.16
15
20
25
30
O bser vation
35
40
45
50
10
_
S=0.1175
0.0
LCL=0
1
5
6
Subgroup
U C L=0.1240
0.12
P otential ( ST ) C apability
0.08
0.04
__
M R=0.0380
0.00
LC L=0
15
20
25
30
O bser vation
35
40
45
5.57511
5.57227
6.1
6.31013
5.8
S pecifications
50
10.40
10.48
A -S quared
P -V alue <
1.29
0.005
M ean
S tD ev
V ariance
S kew ness
Kurtosis
N
10.495
0.061
0.004
-0.948180
0.798194
50
M inimum
1st Q uartile
M edian
3rd Q uartile
M aximum
10.56
10.320
10.460
10.515
10.540
10.610
10.513
Mean
Median
10.48
10.49
10.50
10.51
10.523
10.52
10.53
6.1
S pecifications
10.32
10
M ean
S tDev
Z.U S L
Z.LS L
Z.Bench
Z.S hift
P .U S L
P .LS L
P .Total
Yield
DPMO
Cp
C pk
C C pk
Pp
P pk
P rocess Tolerance
6.32489
5.8
P rocess Tolerance
10
0.1
0.2
UCL=0.2454
10.3
M oving Range
U B=10.6
0.076
Data S ource:
Time S pan:
Data Trace:
ST
LT
5.95
0.125
1.20
1.20
0.74
-0.02
0.115002
0.115002
0.230005
77.00
230004.6
0.40
0.38
0.40
*
*
5.9412
0.123
1.29
1.15
0.76
-0.02
0.0983012
0.125448
0.223749
77.63
223749.0
*
*
*
0.41
0.38
5.60
2.5
USL
5.76
5.92
6.08
A ctual (LT)
Date:
Reported by :
P roject:
Department:
P rocess:
C haracteristic:
U nits:
U pper S pec:
Low er S pec:
N ominal:
O pportunity :
6.24
P otential (S T)
26/03/07
J.N oy ola
A ltura Z C D 338
P roduccion
C ajuela C D 338
A ltura en Z
C ajuela
6.1
5.8
2.0
Zshift
CONTROL
LS L
POBRE
Process Demographics
Process Benchmarks
10000
1000
S igma
(Z.Bench)
100
1.0
DP M O
1
1
10
0.5
A ctual (LT)
P otential (S T)
0.76
0.74
BUENA
223749.0
230004.6
POBRE
10
1.5
1000000
100000
Zst
5 6
BUENA
TECNOLOGIA
A: Control pobre tecnologa inadecuada
B: Se debe controlar mejor el proceso, la tecnologa es inaceptable.
C: Buen control del proceso, tecnologa inadecuada
D: Clase mundial
USL
P rocess D ata
LS L
5.80000
Target
*
USL
6.10000
S ample M ean
5.94120
S ample N
50
S tD ev (Within)
0.12496
S tD ev (O v erall) 0.12298
Within
Ov erall
P otential (Within) C apability
Cp
0.47
C PL
0.44
C PU
0.49
C pk
0.44
C C pk 0.47
O v erall C apability
Pp
PPL
PPU
P pk
C pm
5.60
O bserv ed P erformance
P P M < LS L
40000.00
P P M > U S L 120000.00
P P M Total
160000.00
E xp.
PPM
PPM
PPM
5.76
Within P erformance
< LS L
129253.55
> U S L 101905.69
Total
231159.24
5.92
6.08
6.24
0.47
0.45
0.50
0.45
*
Individual V alue
6.25
C apability Indices
6.15
UCL=6.1089
U B=6.1
6.00
_
X=5.95
6.00
5.85
LB=5.8
5.75
_
_
X=5.9412
LCL=5.7735
1
10
UCL=0.2454
5.50
0.2
15
20
25
30
O bser vation
35
40
45
50
_
S=0.1175
0.1
0.0
0.8
M oving Range
10
LCL=0
1
0.6
U C L=0.5361
5
6
Subgroup
P otential ( ST ) C apability
0.4
__
M R=0.1641
0.0
LC L=0
5
10
15
20
25
30
O bser vation
35
40
45
5.57511
10
P rocess Tolerance
6.32489
5.8
P rocess Tolerance
0.2
5.57227
6.1
6.31013
5.8
S pecifications
6.1
S pecifications
50
5.60
5.76
5.92
6.08
A -S quared
P -V alue <
1.29
0.005
M ean
S tD ev
V ariance
S kew ness
Kurtosis
N
5.9412
0.1224
0.0150
-0.31290
2.06973
50
M inimum
1st Q uartile
M edian
3rd Q uartile
M aximum
6.24
5.5100
5.8800
5.9150
6.0375
6.2200
5.9760
Mean
Median
5.90
5.92
5.94
5.9433
5.96
5.98
M ean
S tDev
Z.U S L
Z.LS L
Z.Bench
Z.S hift
P .U S L
P .LS L
P .Total
Yield
DPMO
Cp
C pk
C C pk
Pp
P pk
0.1525
Data S ource:
Time S pan:
Data Trace:
ST
LT
5.95
0.125
1.20
1.20
0.74
-0.02
0.115002
0.115002
0.230005
77.00
230004.6
0.40
0.38
0.40
*
*
5.9412
0.123
1.29
1.15
0.76
-0.02
0.0983012
0.125448
0.223749
77.63
223749.0
*
*
*
0.41
0.38
10.40
2.5
USL
10.48
10.56
A ctual (LT)
10.64
P otential (S T)
D ate:
Reported by :
P roject:
D epartment:
P rocess:
C haracteristic:
U nits:
U pper S pec:
Low er S pec:
N ominal:
O pportunity :
26/03/07
J.N oy ola
A ltura Z C D 338
P roduccion
C ajuela C D 338
D iametro de enbujado
C ajuela
10.6
10.45
2.0
Zshift
CONTROL
LS L
10.32
POBRE
Process Demographics
Process Benchmarks
10000
1000
S igma
(Z.Bench)
100
A ctual (LT)
P otential (S T)
0.60
1.50
1.0
DP M O
1
1
10
273690.2
66525.0
0.5
BUENA
POBRE
10
1.5
1000000
100000
Zst
5 6
BUENA
TECNOLOGIA
A: Control pobre tecnologa inadecuada
B: Se debe controlar mejor el proceso, la tecnologa es inaceptable.
C: Buen control del proceso, tecnologa inadecuada
D: Clase mundial
USL
P rocess D ata
LS L
10.45000
Target
*
USL
10.60000
S ample M ean
10.48600
S ample N
50
S tD ev (Within)
0.03334
S tD ev (O v erall)
0.03842
Within
Ov erall
P otential (Within) C apability
Cp
0.87
C PL
0.42
C PU
1.33
C pk
0.42
C C pk 0.87
O v erall C apability
Pp
PPL
PPU
P pk
C pm
10.35
O bserv ed P erformance
P P M < LS L
140000.00
PPM > USL
0.00
P P M Total
140000.00
E xp.
PPM
PPM
PPM
10.40
Within P erformance
< LS L
140146.66
> USL
314.34
Total
140461.01
10.45
10.50
10.55
10.60
0.76
0.36
1.15
0.36
*
10.35
10.40
10.45
10.50
A -S quared
P -V alue <
2.11
0.005
M ean
S tD ev
V ariance
S kew ness
Kurtosis
N
10.486
0.038
0.001
-1.02440
1.46797
50
M inimum
1st Q uartile
M edian
3rd Q uartile
M aximum
10.55
LCL=10.4413
10.44
1
5
6
Subgroup
P otential ( ST ) C apability
10.425
10.50
10.3707
10.6
10.6013
10.45
S pecifications
10.51
Individual V alue
10.6
U B=10.6
_
X=10.525
10.5
LB=10.45
1
10.4
M oving Range
0.16
10
15
20
25
30
O bser vation
35
40
45
50
0.12
U C L=0.1060
0.08
__
M R=0.0324
0.04
0.00
LC L=0
5
10
15
20
25
30
O bser vation
35
40
10
M ean
S tDev
Z.U S L
Z.LS L
Z.Bench
Z.S hift
P .U S L
P .LS L
P .Total
Yield
DPMO
Cp
C pk
C C pk
Pp
P pk
P rocess Tolerance
10.625
S pecifications
Median
P rocess Tolerance
10.45
10.49
10
LCL=0
1
Mean
10.48
0.000
10.510
0.048
_
S=0.03134
0.025
10.497
10.480
UCL=0.06547
0.050
10.47
_
_
X=10.486
10.48
10.360
10.458
10.500
10.510
10.570
10.475
C apability Indices
UCL=10.5307
10.52
45
50
10.6
Data S ource:
Time S pan:
Data Trace:
ST
LT
10.525
0.033
2.25
2.25
1.97
1.04
0.0122469
0.0122469
0.0244939
97.55
24493.9
0.75
0.36
0.75
*
*
10.486
0.038
2.97
0.94
0.93
1.04
0.0015032
0.174385
0.175889
82.41
175888.7
*
*
*
0.65
0.31
10.40
USL
10.45
10.50
A ctual (LT)
10.55
10.60
P otential (S T)
D ate:
Reported by :
P roject:
D epartment:
P rocess:
C haracteristic:
U nits:
U pper S pec:
Low er S pec:
N ominal:
O pportunity :
26/03/07
Joel N oy ola
C ajuela C D 338
P roduccion
C ajuela C D 338
D iametro de enbujado
C ajuela
10.6
10.45
1000000
Process Benchmarks
100000
10000
1000
S igma
(Z.Bench)
100
A ctual (LT)
P otential (S T)
0.93
1.97
DP M O
1
Zshift
175888.7
24493.9
1.5
1.0
0.5
BUENA
POBRE
10
1
2.0
CONTROL
10.35
2.5
Process Demographics
LS L
Zst
5 6
BUENA
TECNOLOGIA
10
USL
P rocess D ata
LS L
5.80000
Target
*
USL
6.10000
S ample M ean
5.81440
S ample N
50
S tD ev (Within)
0.11077
S tD ev (O v erall) 0.10921
Within
Ov erall
P otential (Within) C apability
Cp
0.53
C PL
0.05
C PU
1.00
C pk
0.05
C C pk 0.53
O v erall C apability
Pp
PPL
PPU
P pk
C pm
5.6
O bserv ed P erformance
P P M < LS L
400000.00
PPM > USL
20000.00
P P M Total
420000.00
E xp.
PPM
PPM
PPM
5.8
Within P erformance
< LS L
448284.44
> USL
4964.80
Total
453249.24
6.0
6.2
6.4
0.53
0.05
1.02
0.05
*
5.8
6.0
6.2
A -S quared
P -V alue <
4.18
0.005
M ean
S tDev
V ariance
S kew ness
Kurtosis
N
5.8144
0.1086
0.0118
4.5481
27.5988
50
M inimum
1st Q uartile
M edian
3rd Q uartile
M aximum
6.4
5.9
5.7
LCL=5.6658
1
0.0908
_
S=0.1041
0.00
LCL=0
1
5
6
Subgroup
5.8453
P otential ( ST ) C apability
5.61768
0.1354
P rocess Tolerance
6.28232
5.48678
6.1
S pecifications
5.84
6.4
Individual V alue
5.83
6.2
6.0
U B=6.1
_
X=5.95
5.8
LB=5.8
1
5.6
5
10
15
20
25
30
O bser vation
0.8
M oving Range
5.82
6.14202
5.8
S pecifications
5.81
35
40
45
50
1
1
0.6
0.4
U C L=0.3301
0.2
__
M R=0.1010
0.0
LC L=0
5
10
10
P rocess Tolerance
Median
5.80
M ean
S tDev
Z.U S L
Z.LS L
Z.Bench
Z.S hift
P .U S L
P .LS L
P .Total
Yield
DPMO
Cp
C pk
C C pk
Pp
P pk
5.8300
5.8
5.79
10
UCL=0.2175
Mean
5.78
0.15
0.30
5.6600
5.7600
5.8100
5.8500
6.4700
_
_
X=5.8144
5.8
C apability Indices
UCL=5.9630
15
20
25
30
O bser vation
35
40
45
50
6.1
Data S ource:
Time S pan:
Data Trace:
ST
LT
5.95
0.111
1.35
1.35
0.93
0.81
0.0878468
0.0878468
0.175694
82.43
175693.5
0.45
0.04
0.45
*
*
5.8144
0.109
2.62
0.13
0.12
0.81
0.0044580
0.447547
0.452005
54.80
452004.8
*
*
*
0.46
0.04
5.6
Process Demographics
2.5
USL
5.8
6.0
6.2
A ctual (LT)
Date:
Reported by :
P roject:
Department:
P rocess:
C haracteristic:
U nits:
U pper S pec:
Low er S pec:
N ominal:
O pportunity :
6.4
P otential (S T)
26/03/07
Joel N oy ola
C ajuela C D 338
P roduccion
C ajuela C D 338
E spesor de enbujado
C ajuela
6.1
5.8
2.0
Zshift
CONTROL
LS L
POBRE
Process Benchmarks
10000
1000
S igma
(Z.Bench)
100
A ctual (LT)
P otential (S T)
0.12
0.93
10
DP M O
1
1
10
452004.8
175693.5
1.5
1.0
1000000
100000
0.5
BUENA
POBRE
Zst
5 6
BUENA
TECNOLOGIA
A: Control pobre tecnologa inadecuada
B: Se debe controlar mejor el proceso, la tecnologa es inaceptable.
C: Buen control del proceso, tecnologa inadecuada
D: Clase mundial
Within
Ov erall
P otential (Within) C apability
Cp
0.13
C PL
-0.24
C PU
0.49
C pk
-0.24
C C pk 0.13
O v erall C apability
Pp
PPL
PPU
P pk
C pm
5.6
O bserv ed P erformance
P P M < LS L
731707.32
PPM > USL
78048.78
P P M Total
809756.10
E xp.
PPM
PPM
PPM
5.7
5.8
Within P erformance
< LS L 727981.64
> U S L 103095.82
Total
831077.46
5.9
6.0
6.1
6.2
0.13
-0.24
0.50
-0.24
*
USL
P rocess D ata
LS L
10.45000
Target
*
USL
10.55000
S ample M ean
10.53898
S ample N
205
S tD ev (Within)
0.01514
S tD ev (O v erall)
0.01485
Within
Ov erall
P otential (Within) C apability
Cp
1.28
C PL
2.28
C PU
0.28
C pk
0.28
C C pk 1.28
O v erall C apability
Pp
PPL
PPU
P pk
C pm
E xp.
PPM
PPM
PPM
Within P erformance
< LS L
0.00
> U S L 233264.05
Total
233264.05
1.31
2.33
0.29
0.29
*
En base a los resultados de la lnea base se concluye y en vista que todos los anlisis arrojaron el concepto C, es necesario
lo siguiente:
1. Establecer cuales variables X son significativas en mi resultante Y
2. Establecer plan de accion para controlar:
a) Proceso de embujado dentro de especificacin
b) Plan de contingencia para el uso de pernos dentro de especificaciones
3. Realizar DOE para el establecimiento de las variables a controlar que afectan mi Y
LSL
USL
P rocess D ata
LS L
12,00000
Target
*
USL
12,10000
S ample M ean
12,14857
S ample N
35
S tDev (Within)
0,01206
S tDev (O v erall)
0,01249
Within
Ov erall
P otential (Within) C apability
Cp
1,61
C PL
4,78
C PU
-1,56
C pk
-1,56
C C pk 1,61
USL
P rocess D ata
LS L
5,31000
Target
*
USL
6,31000
S ample M ean
6,23543
S ample N
35
S tDev (Within)
0,07874
S tDev (O v erall) 0,08567
Within
Overall
P otential (Within) C apability
Cp
2,47
C PL
4,56
C PU
0,37
C pk
0,37
C C pk 2,47
O v erall C apability
O v erall C apability
Pp
PPL
PPU
P pk
C pm
12,00
O bserv ed P erformance
P P M < LS L
0,00
P P M > U S L 1000000,00
P P M Total
1000000,00
E xp.
PPM
PPM
PPM
12,03
12,06
Within P erformance
< LS L
0,00
> U S L 999971,83
Total
999971,83
12,09
12,12
12,15
5,44
12,18
O bserv ed P erformance
P P M < LS L
0,00
P P M > U S L 142857,14
P P M Total
142857,14
Pp
PPL
PPU
P pk
C pm
1,55
4,62
-1,51
-1,51
*
5,60
5,76
Within P erformance
< LS L
0,00
> U S L 171798,82
Total
171798,82
5,92
6,08
6,24
6,40
USL
P rocess D ata
LS L
8,00000
Target
*
USL
8,10000
S ample M ean
8,07040
S ample N
35
S tDev (Within)
0,01522
S tDev (O v erall) 0,01635
E xp.
PPM
PPM
PPM
LSL
Within
Ov erall
P otential (Within) C apability
Cp
1,28
C PL
1,80
C PU
0,76
C pk
0,76
C C pk 1,28
USL
P rocess D ata
LS L
12,00000
Target
*
USL
12,10000
S ample M ean
12,14857
S ample N
35
S tDev (Within)
0,01206
S tDev (O v erall)
0,01249
Within
Ov erall
P otential (Within) C apability
Cp
1,61
C PL
4,78
C PU
-1,56
C pk
-1,56
C C pk 1,61
O v erall C apability
Pp
PPL
PPU
P pk
C pm
8,00
O bserv ed P erformance
P P M < LS L 0,00
P P M > U S L 0,00
P P M Total
0,00
8,02
8,04
8,06
8,08
2,27
4,20
0,34
0,34
*
O v erall C apability
1,19
1,67
0,70
0,70
*
Pp
PPL
PPU
P pk
C pm
8,10
12,00
O bserv ed P erformance
P P M < LS L
0,00
P P M > U S L 1000000,00
P P M Total
1000000,00
E xp.
PPM
PPM
PPM
12,03
12,06
Within P erformance
< LS L
0,00
> U S L 999971,83
Total
999971,83
12,09
12,12
12,15
12,18
1,55
4,62
-1,51
-1,51
*
USL
P rocess Data
LS L
144,70000
Target
*
USL
145,70000
S ample M ean
145,03400
S ample N
30
S tDev (Within)
0,04502
S tDev (O v erall)
0,04516
LSL
Within
Ov erall
P otential (Within) C apability
Cp
4,31
C PL
2,88
C PU
5,75
C pk
2,88
C C pk 4,31
USL
P rocess D ata
LS L
5,00000
Target
*
USL
6,00000
S ample M ean
5,16867
S ample N
30
S tDev (Within)
0,09184
S tDev (O v erall) 0,09768
Within
Ov erall
P otential (Within) C apability
Cp
2,11
C PL
0,71
C PU
3,52
C pk
0,71
C C pk 2,11
O v erall C apability
Pp
PPL
PPU
P pk
C pm
Pp
PPL
PPU
P pk
C pm
Blanket
O v erall C apability
4,30
2,87
5,73
2,87
*
4,95
O bserv ed P erformance
P P M < LS L
33333,33
PPM > USL
0,00
P P M Total
33333,33
5,10
5,25
5,40
5,55
5,70
5,85
USL
LSL
Within
Ov erall
P otential (Within) C apability
Cp
1,73
C PL
1,98
C PU
1,48
C pk
1,48
C C pk 1,73
USL
P rocess D ata
LS L
12,00000
Target
*
USL
12,10000
S ample M ean
12,14567
S ample N
30
S tDev (Within)
0,02000
S tDev (O v erall)
0,02258
Within
Ov erall
P otential (Within) C apability
Cp
0,97
C PL
2,83
C PU
-0,89
C pk
-0,89
C C pk 0,97
O v erall C apability
Pp
PPL
PPU
P pk
C pm
8,00
8,02
8,04
8,06
8,08
6,00
P rocess D ata
LS L
8,00000
Target
*
USL
8,10000
S ample M ean
8,05733
S ample N
30
S tDev (Within)
0,01122
S tDev (O v erall) 0,01057
O bserv ed P erformance
P P M < LS L 0,00
P P M > U S L 0,00
P P M Total
0,00
1,99
0,67
3,31
0,67
*
O v erall C apability
1,84
2,11
1,57
1,57
*
Pp
PPL
PPU
P pk
C pm
8,10
12,00
O bserv ed P erformance
P P M < LS L
0,00
P P M > U S L 900000,00
P P M Total
900000,00
E xp.
PPM
PPM
PPM
12,03
12,06
Within P erformance
< LS L
0,00
> U S L 988802,22
Total
988802,22
12,09
12,12
12,15
12,18
0,86
2,50
-0,79
-0,79
*
USL
P rocess D ata
LS L
12,00000
Target
*
USL
12,10000
S ample M ean
12,07120
S ample N
50
S tDev (Within)
0,00848
S tDev (O v erall)
0,00923
LSL
Within
Ov erall
P otential (Within) C apability
Cp
2,29
C PL
3,26
C PU
1,32
C pk
1,32
C C pk 2,29
USL
P rocess D ata
LS L
12,00000
Target
*
USL
12,10000
S ample M ean
12,08460
S ample N
50
S tDev (Within)
0,00970
S tDev (O v erall)
0,01040
Within
Ov erall
P otential (Within) C apability
Cp
2,00
C PL
3,39
C PU
0,62
C pk
0,62
C C pk 2,00
O v erall C apability
Pp
PPL
PPU
P pk
C pm
12,00
O bserv ed P erformance
P P M < LS L 0,00
P P M > U S L 0,00
P P M Total
0,00
12,02
12,04
12,06
12,08
O v erall C apability
2,10
3,00
1,21
1,21
*
Pp
PPL
PPU
P pk
C pm
12,10
12,00
O bserv ed P erformance
P P M < LS L 0,00
P P M > U S L 0,00
P P M Total
0,00
12,02
12,04
USL
P rocess D ata
LS L
12,00000
Target
*
USL
12,10000
S ample M ean
12,07120
S ample N
50
S tDev (Within)
0,00848
S tDev (O v erall)
0,00923
Within
Ov erall
P otential (Within) C apability
Cp
2,29
C PL
3,26
C PU
1,32
C pk
1,32
C C pk 2,29
O v erall C apability
Pp
PPL
PPU
P pk
C pm
12,00
O bserv ed P erformance
P P M < LS L 0,00
P P M > U S L 0,00
P P M Total
0,00
12,02
12,04
12,06
12,08
12,10
2,10
3,00
1,21
1,21
*
12,06
12,08
12,10
1,87
3,16
0,58
0,58
*
USL
P rocess Data
LS L
106,40000
Target
*
USL
106,60000
S ample M ean
106,56246
S ample N
65
S tDev (Within)
0,04582
S tDev (O v erall)
0,04648
Within
Ov erall
P otential (Within) C apability
Cp
0,85
C PL
1,38
C PU
0,32
C pk
0,32
C C pk 0,85
O v erall C apability
Pp
PPL
PPU
P pk
C pm
E xp.
PPM
PPM
PPM
Within P erformance
< LS L
195,73
> U S L 206310,68
Total
206506,41
0,84
1,36
0,31
0,31
*
LSL
USL
P rocess D ata
LS L
10.45000
Target
*
USL
10.60000
S ample M ean
10.46267
S ample N
30
S tDev (Within)
0.03868
S tDev (O v erall)
0.04229
LSL
Within
Ov erall
P otential (Within) C apability
Cp
0.75
C PL
0.13
C PU
1.38
C pk
0.13
C C pk 0.75
USL
P rocess D ata
LS L
10.45000
Target
*
USL
10.60000
S ample M ean
10.57167
S ample N
30
S tDev (Within)
0.01499
S tDev (O v erall)
0.02087
Within
Ov erall
P otential (Within) C apability
Cp
1.94
C PL
3.15
C PU
0.73
C pk
0.73
C C pk 1.94
O v erall C apability
Pp
PPL
PPU
P pk
C pm
10.40
O bserv ed P erformance
P P M < LS L
300000.00
PPM > USL
0.00
P P M Total
300000.00
E xp.
PPM
PPM
PPM
10.45
Within P erformance
< LS L
371642.13
> USL
191.98
Total
371834.11
10.50
10.55
O v erall C apability
0.69
0.12
1.26
0.12
*
Pp
PPL
PPU
P pk
C pm
10.60
10.47
O bserv ed P erformance
P P M < LS L
0.00
P P M > U S L 66666.67
P P M Total
66666.67
10.50
10.56
10.59
10.62
USL
P rocess D ata
LS L
10.45000
Target
*
USL
10.60000
S ample M ean
10.53567
S ample N
60
S tDev (Within)
0.02886
S tDev (O v erall)
0.04450
10.53
LSL
Within
Ov erall
P otential (Within) C apability
Cp
1.01
C PL
1.15
C PU
0.87
C pk
0.87
C C pk 1.01
USL
P rocess D ata
LS L
10.45000
Target
*
USL
10.60000
S ample M ean
10.46267
S ample N
30
S tDev (Within)
0.03868
S tDev (O v erall)
0.04229
Within
Ov erall
P otential (Within) C apability
Cp
0.75
C PL
0.13
C PU
1.38
C pk
0.13
C C pk 0.75
O v erall C apability
Pp
PPL
PPU
P pk
C pm
10.40
O bserv ed P erformance
P P M < LS L
50000.00
PPM > USL
0.00
P P M Total
50000.00
10.45
10.50
10.55
O v erall C apability
0.65
0.75
0.56
0.56
*
Pp
PPL
PPU
P pk
C pm
10.60
1.40
2.26
0.53
0.53
*
10.40
O bserv ed P erformance
P P M < LS L
300000.00
PPM > USL
0.00
P P M Total
300000.00
E xp.
PPM
PPM
PPM
10.45
Within P erformance
< LS L
371642.13
> USL
191.98
Total
371834.11
10.50
10.55
10.60
0.69
0.12
1.26
0.12
*
USL
P rocess D ata
LS L
-1.00000
Target
*
USL
1.00000
S ample M ean
-0.26000
S ample N
32
S tD ev (Within)
1.28250
S tD ev (O v erall)
1.25996
Within
Ov erall
P otential (Within) C apability
Cp
0.30
C PL
0.22
C PU
0.38
C pk
0.22
C C pk 0.30
O v erall C apability
Pp
PPL
PPU
P pk
C pm
-3
O bserv ed P erformance
P P M < LS L
437500.00
P P M > U S L 187500.00
P P M Total
625000.00
E xp.
PPM
PPM
PPM
-2
-1
Within P erformance
< LS L
281971.12
> U S L 162938.50
Total
444909.62
0.31
0.23
0.39
0.23
*
USL
LSL
P rocess D ata
LS L
-1.00000
Target
*
USL
1.00000
S ample M ean
0.82188
S ample N
16
S tD ev (Within)
0.87192
S tD ev (O v erall)
0.81925
Within
Ov erall
P otential (Within) C apability
Cp
0.45
C PL
0.81
C PU
0.08
C pk
0.08
C C pk 0.45
USL
P rocess D ata
LS L
-1.00000
Target
*
USL
1.00000
S ample M ean
-1.34188
S ample N
16
S tD ev (Within)
0.28142
S tD ev (O v erall)
0.29155
Within
Ov erall
P otential (Within) C apability
Cp
1.38
C PL
-0.47
C PU
3.23
C pk
-0.47
C C pk 1.38
O v erall C apability
Pp
PPL
PPU
P pk
C pm
-1.0 -0.5
O bserv ed P erformance
P P M < LS L
0.00
P P M > U S L 375000.00
P P M Total
375000.00
E xp.
PPM
PPM
PPM
0.0
Within P erformance
< LS L
18331.92
> U S L 419063.62
Total
437395.54
0.5
1.0
1.5
2.0
O v erall C apability
0.47
0.86
0.08
0.08
*
Pp
PPL
PPU
P pk
C pm
2.5
-2.0
O bserv ed P erformance
P P M < LS L
875000.00
PPM > USL
0.00
P P M Total
875000.00
E xp.
PPM
PPM
PPM
-1.6
-1.2
Within P erformance
< LS L
887782.89
> USL
0.00
Total
887782.89
-0.8
-0.4
-0.0
0.4
0.8
1.33
-0.46
3.12
-0.46
*
DC C arrocera
D. Parte 1
DC. Parte 2
10.60
215.4
216.4
10.45
10.55
5
1
0.5
DC Carrocera
-1
Mean of Altura en Z
0.0
-0.5
D. Parte 1
-1.0
D. Parte 1
10.45
10.60
-1
106.4
1.0
DC Carrocera
106.4
106.6
106.6
10.45
Ancho de perno
10.60
215.4
216.4
Deformacion
DC. Parte 2
-1
0.5
0.0
Ancho de perno
-1
-0.5
-1.0
Deformacion
10.45
10.55
0.34
1.70
0.68
0.37
0.55
2.52
-0.45
0.30
-0.08
0.60
0.73
1.68
-0.01
-0.01
Deformacion
-1.47
-1.49
-1.47
-1.49
0
-1.47
-1.47
-1.21
-1.47
10.6
D. Parte 1
-1.47
-0.41
-1.48
-1.47
10.45
-1.30
216.4
DC. Parte 2
-0.96
215.4
106.4
DC Carrocera
106.6
10.45
Ancho de perno
10.55
-1.49
-1.35
DC.
Parte
2
215.4
216.4
Ancho
de
perno
10.45
10.55
99
Effect Ty pe
Not Significant
Significant
95
90
80
BE
70
60
50
40
30
F actor
A
B
C
E
A
BE
Term
AE
AE
20
10
5
C
0
5
10
Standardized Effect
15
20
10
15
Standardized Effect
99
0.5
90
Residual
-5
50
0.0
10
1
-0.8
-0.4
0.0
Residual
0.4
-0.5
0.8
-2
-1
0
Fitted Value
8
0.5
Residual
-10
Percent
F actor
A
B
C
E
N ame
D C C arrocera
D . P arte 1
D C . P arte 2
D eformacion
Frequency
Percent
2.06
0.0
2
0
-0.4
-0.2
0.0
0.2
Residual
0.4
0.6
-0.5
8 10 12 14 16 18 20 22 24 26 28 30 32
Observation Order
20
N ame
D C C arrocera
D . P arte 1
D C . P arte 2
D eformacion
DOE Resultados
DOE Resultados
Donde:
X:
Y:
M:
D:
Z:
En base a los resultados se concluye que la variable que afecta mas la altura en Z tomando en cuenta las variables de
los componentes es el grado de deformacin D, adems de controlar esta variable de proceso tenemos:
D=
D = 6.0 mm.
2. Dimencionamiento de troquel
3. Ajuste de dimensiones de troquel
4. Prueba de implementacin
5. Medicin de implementacin
6. Ajuste del sistema