Está en la página 1de 5

Straining graphene by chemical vapor deposition growth on copper

V. Yu, E. Whiteway, J. Maassen, and M. Hilke


Department of Physics, McGill University, Montréal, Canada, H3A 2T8
(Dated: April 27, 2011)
Strain can be used as an alternate way to tune the electronic properties of graphene. Here we
demonstrate that it is possible to tune the uniform strain of graphene simply by changing the
chemical vapor deposition growth temperature of graphene on copper. Due to the cooling of the
graphene on copper system, we can induce a uniform compressive strain on graphene. The strain is
analyzed by Raman spectroscopy, where a shift in the 2D peak is observed and compared to our ab
initio calculations of the graphene on copper system as a function of strain, exhibiting a change in
Fermi energy as a function of strain.

PACS numbers: 78.30.-j, 63.22.-m, 62.20.D-, 81.05.ue, 79.60.Jv, 68.65.-k, 81.15.Gh

The discovery of the electric field effect in a few layers In this letter, we demonstrate that it is possible to
of graphene [1, 2] led to a genuine explosion of work on strain graphene intrinsically and uniformly during the
graphene with the subsequent observation of the anoma- graphene growth process leading to interesting new prop-
lous quantum Hall effect in graphene monolayers [3, 4] erties, such as a change in Fermi energy and Fermi veloc-
following its theoretical prediction [5]. The most impor- ity in graphene. This opens new doors to the possibility
tant property for electronic device applications is the pos- of engineering devices, where the electronic properties are
sibility to tune the resistance and electronic density of the tuned by strain in addition to providing us with a bet-
graphene sheet. This is achieved by using the substrate ter understanding of large scale graphene production by
directly as a backgate [1, 3, 4] or by processing a top gate CVD.
[2]. To accurately model the system, we performed ab ini-
More recently, it was suggested theoretically that it is tio calculations by considering the situation depicted in
possible to tune the electronic density of graphene and figure 1, where a graphene monolayer is sitting on a
create confinement [6], as well as to observe a zero-field Cu(111) surface. We assume that graphene and Cu share
quantum Hall effect by using strain engineering [7]. In the same in-plane lattice constant [14] and that the sys-
general, strain as a way to enhance electronic and opti- tem has no structural defects, meaning that graphene
cal properties in semiconductors has been very successful and Cu match perfectly at the interface. In this case, the
[8]. Mechanically, graphene turns out to be of very high most stable configuration of graphene on Cu(111) cor-
strength [9] and is stretchable up to 30% in some cases responds to one carbon sitting at the top-site (A-site)
[10]. and the other carbon located at the hollow-site (C-site)
[15, 16]. The same configuration also applies to graphene
While exfoliated graphene bears very high mobilities
on other metallic surfaces [17]. To induce strain, we uni-
when suspended [11], the size is limited to a few microns.
formly expand or compress the in-plane lattice constant
Large scale epitaxial graphene on SiC is an interesting
of the whole graphene/Cu system.
avenue but suffers from high substrate costs and difficulty
to transfer [12]. Alternatively, large scale graphene can Zero strain corresponds to a C-C bond length of
be synthesized by chemical vapor deposition (CVD) using aeq =1.415 Å, which was found to minimize the total en-
a polycrystalline metal foil as a catalyst [10, 13]. ergy of an isolated graphene sheet using density func-
tional theory. For every a, we (i) perform a structural
relaxation of the system to ensure that the forces acting
on each atom is less than 0.01 eV/Å, (ii) obtain the self-
consistent electronic density and Hamiltonian and (iii)
calculate the band structure of the hybrid graphene/Cu
system along the high-symmetry points Γ, M and K.
The most striking features induced by the strain are
the change in Fermi velocity close to the Dirac point and
more notably a shift in the Fermi energy with respect to
the Dirac point as a function of strain as shown in figure
FIG. 1: View of graphene on a Cu(111) surface. The grey 2b, which enables the tuning of the electronic density in
and dark orange spheres represent the C and Cu atoms, re- graphene by strain. This mainly arises because a uniform
spectively. The blue parallelogram delimits the area of the lateral compression leads to an increase in Cu-graphene
supercell used for the first principles calculations. The letters distance.
A, B and C depict the different Cu(111) sites. Experimentally, we expect to be able to strain
2

a) 1.5 Com pressed b) 0.9 0.6


KK'-(KK') eq EF
δq
1.0 δ q- δ q eq

Wavenumber [nm ]
0.4

-1
0.6
0.5 δ k- δ k eq

EF (eV)
E (eV)

0.3 0.2
0.0 K E laser
-0.5 5 Å 0.0 0.0
41
1. δ q eq
Å
32

-1.0
a= -0.3
1.

-0.2
a=

-1.5
Γ K M -4 -3 -2 -1 0 1 2
Strain (% )
c)

δk Kδq
compression K’ M M
compression
FIG. 3: SEM images of graphene on Cu grown for 30 minutes
FIG. 2: a) Band structure of graphene on Cu close to the K with different growth temperatures: (a) 882◦ C, (b) 932◦ C (c)
point for two different values of strain, i.e., 0% (solid line) 957◦ C, and (d) 1032◦ C, respectively. Each image is approxi-
and -6.7% (dashed line). b) depicts the change of EF (rel- mately 30µm×30µm.
ative to the Dirac point), δk, δq and KK′ as a function of
strain. c) Partial view of the Brillouin zone with the corre-
sponding bandstructure. The arrow labeled δk indicates the
phonon process at the origin of the 2D Raman peak. The dominant peaks, labeled G and 2D. The G peak around
arrow labeled δq corresponds to the wavenumber of the Ra- 1576 cm−1 arises from a first order G band phonon pro-
man excited electron. biaxial compression would expand the cess. The energy corresponds to the phonon energy at the
Brillouin zone uniformly. Γ point, which is degenerate. Several authors have shown
that the degeneracy is lifted by the application of uniax-
ial strain [22], which leads to a splitting of the G peak.
graphene on Cu simply by heating the combined sys- For uniform biaxial strain, there are no experiments on
tem, since the thermal expansion of Cu is different from compressive strain in graphene, but we expect the strain
that of graphene. While graphene has a small nega- to simply renormalize the phonon energy (ω G ) following
tive thermal expansion coefficient α [18], for Cu we have ω G = ωeqG
(1 − 2ϵγ) [23, 24], γ ≃ 1.24 is the Grüneisen
α ≃ 25.8 × 10−6 /◦ C [19] at 1000◦ C. This would lead parameter in carbon nanotubes [25], ϵ = (a − aeq )/aeq is
to a relative graphene compression of 0.5% from 1082 to the strain and the factor 2 stems from the biaxial strain
882◦ C. in both directions.
We synthesized graphene monolayers by CVD of hy-
drocarbons on 25 µm-thick commercial polycrystalline
copper foils. The Cu foil is first acid-treated for 10 mins
using acetic acid and then washed thoroughly with de-
ionized water. Graphene growth is realized in similar
conditions to the recently reported ones [20, 21], but
using a vertical quartz tube. Graphene is grown with
temperatures ranging from 882◦ C to 1082◦ C in 0.5 Torr,
with a 4 sccm H2 flow and a 40 sccm CH4 flow for 30
minutes. The temperature was calibrated using as fixed
point the melting temperature of Cu in the same condi-
tions (1083◦ C). During the cooling process the methane
flow is stopped while the hydrogen flow is kept on.
Figure 3 illustrates the temperature effect on the syn- FIG. 4: Raman spectra for each growth temperature normal-
thesis of graphene. These scanning electron micro- ized to the 2D peak. Inset: Close-up of the 2D peaks showing
scope (SEM) images show that the density and size of the shifts of the peaks. The 957◦ C spectrum shows a region
growth domains increase with temperature. At the low- of possible bilayer.
est growth temperatures we did not observe full coverage,
even for longer growth times. The other dominant peak is labeled 2D (also called G′ )
The graphene layer was characterized by Raman spec- and stems from a two phonon process. The two phonons
troscopy at 514nm. The results are shown in figure 4, of wavenumber δk and -δk scatter the Raman excited
where the Cu contribution was subtracted. There are two electron with wavenumber δq into the other valley (K
3

to K′ ) and back as illustrated in figure 2c and therefore Growth temperature ( C)


o

depends on the electronic band structure [26]. Narula


1400 1200 1000 800 600 400 200
and Reich [27] have then shown that the dominant con-
2800
tribution to the 2D peak for unstrained graphene occurs 2D peak

for electronic states close to the K-M axis and that the

Raman shift (cm )


2600

-1
o
other states can be neglected. For uniform strain the sit- Growth temperature ( C)
1100 1000 900
2720
uation is similar. Hence, δk will depend on the electronic 2400

Raman shift (cm )


-1
2D peak
band structure along K-M, which is shown in figure 2a for 2710

two different values of strain. Using the calculated elec- 2200 2700

tronic band structure we can extract δq in the M direction 2690

for our Raman laser energy Elaser = 2.412 eV (514 nm). 2000

Geometrically, we have δk 2 = (KK′ + δq)2 + 3δq 2 (see


2680

figure 2c), where KK′ =K−K′ is the distance in recipro- 1800 2670
-0.6 -0.5 -0.4 -0.3 -0.2 -0.1 0.0

cal space between the two valleys K and K′ . KK′ will G peak Strain (%)

1600
simply be renormalized by a uniform strain leading to
KK′ = (KK′ )eq /(1 + ϵ), which is shown in figure 2b. -1.5 -1.0 -0.5 0.0 0.5 1.0 1.5
For small values of ϵ, the renormalization constant is ap-
Uniform strain (%)
proximately linear in strain. δk, on the other hand, is
non-linear as it depends on δq.
In this region, the phonon band velocity can be pa- FIG. 5: The Raman shift of the 2D and G peaks as a func-
rameterized by viT O = 5.47 × 10−3 vF [23], where vF ≃ tion of strain obtained from the ab initio results. The solid
106 m/s is the Fermi velocity. In order to evaluate the line and the dotted line for the 2D peak are obtained, respec-
change in phonon energy due to uniform strain for the tively, with and without considering the effect of the electronic
2D peak we simply combine the change in wavenumber band structure. The square symbols are the experimental
data points obtained for different growth temperatures. The
δk from the linear dispersion with the renormalized to-
inset shows a zoom-in of the 2D peak data points.
tal phonon energy due to the Grüneisen parameter as
ω 2D ≃ [ωeq2D
+ 2viT O (δk − δkeq )](1 − 2ϵγ). The factor 2 in
front of the band velocity term stems from the phonon
pair involved in the process. For the equilibrium (un- (like grain boundaries), which compresses the graphene
(2D,G) layer upon cooling.
strained) values of ωeq , we use those obtained for ex-
foliated graphene at the same wavelength (514nm) [28], Raman spectroscopy can be employed to determine the
2D
i.e., ωeq = 2678cm−1 and ωeq G
= 1576cm−1 . We can now number of graphene layers [29] by looking at the ratio of
evaluate the expected frequencies for the 2D and G peaks the G and 2D peak heights, which confirms that we have
as a function of a uniform strain. We then perform a best mainly single layered graphene as expected in CVD on
fit between the calculated energies of the 2D peak as a Cu [20]. In our Raman data we see that adding a second
function of strain and the experimental data as a func- layer would change this ratio substantially, even if the
tion of growth temperature, which is shown in figure 5. layers are not A-B stacked.
This allows us to identify the growth temperature (top It is instructive to compare our results to those ob-
scale) with strain (bottom scale), assuming a linear de- tained for exfoliated graphene, where several groups have
pendence. We also show the result (in dotted lines) for been able to detect uniaxial stain in exfoliated graphene
the 2D peak computed without the band structure effect, flakes using Raman spectroscopy [31]. The reported
which is then simply a linear function of strain. The dif- shifts in the 2D peak vary from -7.8 cm−1 /1% to -66
ference between the full curve (ab-initio result) and the cm−1 /1%. It was recently suggested that the large range
dotted curve (no Cu) is very small in this strain range. of values could be due to the dependence on the polar-
The data fits nicely with the expected Raman shift ization of the laser beam and orientation of the graphene
when the difference in strain between growth tempera- lattice [32]. Our results, between 0 and -1% strain, give
tures of 982 and 1082◦ C is -0.4%, which is close to the values of -66 cm−1 /1% (without band structure effect)
expected value from the thermal expansion of Cu for this and -79 cm−1 /1% (with band structure effect), which
temperature range (-0.5%). This clearly demonstrates is the higher bound of the reported values for uniaxial
that it is possible to strain graphene uniformly, simply by strain. This is consistent with expectations, since for bi-
changing the CVD growth temperature, which is one of axial strain we expect approximately a doubling of the
the important results of this letter. This also shows that strain induced Raman shift. In a very different geometry,
when graphene is grown at high temperatures it is under where stretched biaxial strain has been measured by de-
small compressive strain at room temperature (the Ra- positing a graphene flake on a shallow depression, a very
man spectra are taken at room temperature). It is likely high 2D peak shift of about 200 cm−1 /1% was reported
that the observed strain effect is due to defect pinning [33]. In epitaxial graphene, shifts of the principal Ra-
4

man peaks were observed to be dependent on the growth S. Dresselhaus and J. Kong, Nano Letters 9, 30 (2008).
time for a fixed annealing temperature [34]. For CVD on [14] All simulations are performed using the vasp density
nickel, no systematic shift with growth temperature was functional theory package [G. Kresse and J. Furthmuller,
observed [35]. Phys. Rev. B 54, 11169 (1996); Comput. Mater. Sci. 6, 15
(1996)]. The supercell includes a graphene sheet adsorbed
The formed graphene/Cu heterostructure constitutes on a Cu slab composed of 6 layers and a vacuum region of
a very interesting system by itself. Not only can the roughly 13.5 Å. We employ the local density approxima-
amount of relative strain be tuned as shown above, lead- tion [J. P. Perdew and A. Zunger, Phys. Rev. B 23, 5048
ing to changes in the Fermi energy and Fermi velocity, (1981)] for exchange-correlation energy, an energy cutoff
of 550 eV for the plane wave basis and the projector aug-
but this system also opens the door to numerous appli-
mented wave method. A k-point mesh of 255×255×1 is
cations. For instance, the added graphene layer can en- used for calculating the self-consistent density, whereas
hance electronic properties in Cu interconnects, for ex- a 45×45×1 grid is utilized to make the structural relax-
ample, or greatly enhance thermal conductivities of thin ations tractable. The Brillouin zone integration is carried
Cu films. The tunability of the strain of the graphene out using the tetrahedron method while ensuring the in-
layer, greatly increases this potential. The graphene/Cu clusion of the high symmetry points Γ, K and M.
heterostructure can also be selectively etched for partial [15] G. Giovannetti, P. A. Khomyakov, G. Brocks, V. M.
Karpan, J. van der Brink and P. J. Kelly, Phys. Rev.
or full transfer onto other substrates, which can lead to
Lett. 101, 026803 (2008).
interesting transport properties such as a very sharp weak [16] J. Maassen, W. Ji and H. Guo, Appl. Phys. Lett. 97,
localization peak [36]. 142105 (2010).
We would like to acknowledge help from S. Elouatik for [17] J. Maassen, W. Ji and H. Guo, Nano Lett.
the Raman characterization and the use of MIAM micro- DOI: 10.1021/nl1031919 (published online).
[18] W. Bao, F. Miao, Z. Chen, H. Zhang, W. Jang, C. Dames
fab facilities and GCM at Polytechnique for processing
and C. N. Lau, Nat. Nanotech. 4, 562 (2009).
and characterization in addition to financial support from [19] Y. S. Touloukian, Thermophysical properties of matter
RQMP, NSERC and FQRNT. (IFI/Plenium, New York), 1970.
[20] X. Li, W. Cai, J. An, S. Kim, J. Nah, D. Yang, R. Piner,
A. Velamakanni, I. Jung, E. Tutuc, S. K. Banerjee, L.
[1] K. S. Novoselov, A. K. Geim, S. V. Morozov, D. Jiang, Y. Colombo and R. S. Ruoff, Science 324, 1312 (2009).
Zhang, S. V. Dubonos, I. V. Grigorieva and A. A. Firsov, [21] S. Bae, H. Kim, Y. Lee, X. Xu, J.-S. Park, Y. Zheng, J.
Science 306, 666 (2004). Balakrishnan, T. Lei, H. Ri Kim, Y. I. Song, Y.-J. Kim,
[2] C. Berger, et al., J. Phys. Chem. B 108, 19912 (2004); K. S. Kim, B. Ozyilmaz, J.-H. Ahn, B. H. Hong and S.
J. S. Bunch, Y. Yaish, M. Brink, K. Bolotin & P. L. Iijima, Nat. Nanotechnol., 5, 574 (2010).
McEuen, Nano Lett. 5, 287290 (2005); Y. Zhang, J. P. [22] M. Huang, H. Yan, C. Chen, D. Song, T. F. Heinz, and J.
Small, M. E. S. Amori, & P. Kim, Phys. Rev. Lett. 94, Hone, Proc. Natl. Acad. Sci. U.S.A. 106, 7304 (2009); T.
176803 (2005). M. G. Mohiuddin, A. Lombardo, R. R. Nair, A. Bonetti,
[3] K. S. Novoselov, A. K. Geim, S. V. Morozov, D. Jiang, G. Savini, R. Jalil, N. Bonini, D. M. Basko, C. Gali-
M. I. Katsnelson, I. V. Grigorieva, S. V. Dubonos, and otis, N. Marzari, K. S. Novoselov, A. K. Geim and A.
A. A. Firsov, Nature (London) 438, 197 (2005). C. Ferrari, Phys. Rev. B 79, 205433 (2009); O. Frank,
[4] Y. Zhang, Y. W. Tan, H. L. Stormer and P. Kim, Nature G. Tsoukleri, J. Parthenios, K. Papagelis, I. Riaz, R.
438, 201 (2005). Jalil, K. S. Novoselov and C. Galiotis, ACS Nano 4, 3131
[5] Y. Zheng & T. Ando Phys. Rev. B 65, 245420 (2002). (2010).
[6] V. M. Pereira and A. H. Castro Neto, Phys. Rev. Lett. [23] L. M. Malard, M. A. Pimenta, G. Dresselhaus and M. S.
103, 046801 (2009). Dresselhaus, Physics Reports 473, 51 (2009).
[7] F. Guinea, M. I. Katsnelson, A. K. Geim, Nature Physics [24] C. Thomsen, S. Reich and P. Ordejon, Phys. Rev. B 65
6, 30 (2009). 073403 (2002).
[8] Y. Sun, S. E. Thompson, and T. Nishida, Strain Effect [25] S. Reich, H. Jantoljak, and C. Thomsen, Phys. Rev. B
in Semiconductors, Springer (2010). 61, R13389 (2000).
[9] C. Lee, X. Wei, J. W. Kysar, and J. Hone, Science 321, [26] C. Thomsen and S. Reich, Phys. Rev. Lett. 85, 5214
385 (2008). (2000).
[10] K. S. Kim, Y. Zhao, H. Jang, S. Y. Lee, J. M. Kim, K. [27] R. Narula and S. Reich, Phys. Rev. B 78, 165422 (2008).
S. Kim, J.-H. Ahn, P. Kim, J.-Y. Choi and B. H. Hong, [28] V. Yu and M. Hilke, Appl. Phys. Lett. 95, 151904 (2009).
Nature 457, 706 (2009). [29] A. C. Ferrari, J. C. Meyer, V. Scardaci, C. Casiraghi, M.
[11] K. I. Bolotin, K. J. Sikes, Z. Jiang, M. Klima, G. Fu- Lazzeri, F. Mauri, S. Piscanec, D. Jiang, K. S. Novoselov,
denberg, J. Hone, P. Kim and H. L. Stormer, Solid State S. Roth and A. K. Geim, Physical Review Letters 97,
Communications 146, 351 (2008). 187401 (2006).
[12] J. Hass, R. Feng, T. Li, X. Li, Z. Zong, W. A. de Heer, [30] See supporting documents.
P. N. First, E. H. Conrad, C. A. Jeffrey and C. Berger, [31] Z. H. Ni, T. Yu, Y. H. Lu, Y. Y. Wang, Y. P. Feng and
Appl. Phys. Lett. 89, 143106 (2006); J. D. Caldwell, T. Z. X. Shen, ACS Nano 2, 2301 (2008); G. Tsoukleri, J.
J. Anderson, J. C. Culbertson, G. G. Jernigan, K. D. Parthenios, K. Papagelis, R. Jalil, A. C. Ferrari, A. K.
Hobart, J. F. Kub, M. J. Tadjer, J. L. Tedesco, J. K. Geim, K. S. Novoselov and C. Galiotis, Small 5, 2397
Hite, M. A. Mastro et al. ACS Nano 4, 1108 (2010). (2009); T. Yu, Z. Ni, C. Du, Y. You, Y. Wang and Z.
[13] A. Reina, X. Jia, J. Ho, D. Nezich, H. Son, V. Bulovic, M. Shen, The Journal of Physical Chemistry C 112, 12602
5

(2008). [35] S. J. Chae, F. Gne, K. K. Kim, E. S. Kim, G. H. Han,


[32] M. Huang, H. Yan, T. F. Heinz and J. Hone, Nano Letters S. M. Kim, H.-J. Shin, S.-M. Yoon, J.-Y. Choi, M. H.
10, 4074 (2010). Park, C. W. Yang, D. Pribat and Y. H. Lee, Advanced
[33] C. Metzger, S. Remi, M. Liu, S. V. Kusminskiy, A. H. Materials 21, 2328 (2009).
Castro Neto, A. K. Swan and B. B. Goldberg, Nano Let- [36] E. Whiteway, V. Yu, J. Lefebvre, R. Gagnon, and M.
ters 10, 6 (2010). Hilke, arXiv:1011.5712
[34] N. Ferralis, R. Maboudian and C. Carraro, Physical Re-
view Letters 101, 156801 (2008).

También podría gustarte