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Chapter 13

Control Strategies at the Process


Unit Level
CHAPTER CONTENTS

13.1 Degrees of Freedom Analysis for Process Control


13.1.1 Control Degrees of Freedom
13.1.2 Effect of Feedback Control
13.2 Selection of Controlled, Manipulated, and Measured Variables
13.2.1 Controlled Variables
13.2.2 Manipulated Variables
13.2.3 Measured Variables
13.3 Applications
13.3.1 Distillation Column
13.3.2 Fired-Tube Furnace
13.3.3 Catalytic Converters for Automobiles
13.3.4 Plasma Etching in Semiconductor Processing
Summary

Previous chapters have emphasized process control variables are process variables that affect one or more
problems with a single controlled variable and single output variables.
manipulated variable. In this chapter, we show that these Input variables are classified as either manipulated
concepts and analysis methods are also applicable to variables (MVs) or disturbance variables (DVs). Manip-
control problems at the process unit level that have mul- ulated variables are used to adjust the rates of material
tiple controlled variables (CVs) and multiple manipu- and energy that enter or leave a process. The MVs are
lated variables (MVs). These types of control problems often flow rates adjusted by control valves, variable-
are considered further in Chapters 18, 20, 25, and 26. speed pumps or compressors, or conveyor belts (for solid
For control system design and analysis, it is conve- materials). An energy input, such as the power to an
nient to classify process variables as being either out- electrical heater, can also be an MV. If an MV is a flow
put variables or input variables. The output variables rate, there must be some place for the material to accu-
(or outputs) are dependent variables that typically are mulate. For example, it is not feasible to place two
associated with exit streams or conditions within a control valves at different locations on the same pipe.
process vessel (e.g., compositions, temperatures, lev- Manipulated variables are often inlet flow rates. How-
els, and flow rates). Some outputs must be controlled ever, an exit flow rate can also be an MV, for example,
in order to operate a process in a satisfactory manner. when the liquid level in a tank is controlled by manipu-
They are called controlled variables (CVs). Input lating an exit flow rate.

236
13.1 Degrees of Freedom Analysis for Process Control 237

By definition, disturbance variables are input vari-


ables that cannot be manipulated. Common DVs include
ambient conditions and feed streams from upstream
process units.

13.1 DEGREES OF FREEDOM ANALYSIS


FOR PROCESS CONTROL (a) Stream splits
(b) Streams merge

The important concept of degrees of freedom, NF, was Figure 13.1 Two examples where all three streams cannot be
introduced in Section 2.3 in connection with process manipulated independently.
modeling. It is the number of process variables that
must be specified in order to be able to determine the
remaining process variables. If a dynamic model is
available, NF can be determined from a relation in Two examples illustrate the General Rule.
Chapter 2,
NF = Nv- NE (13-1)
EXAMPLE 13.1
where Nv is the number of process variables and N E is
the number of independent equations. Determine Npand Npc for the steam-heated, stirred-tank
For process control applications, it is very important system model in Eqs. 2-50 through 2-52 in Chapter 2.
to determine the maximum number of process vari- Assume that only steam pressure P8 can be manipulated.
ables that can be independently controlled, that is, to
determine the control degrees of freedom, N Fe: SOLUTION
To calculate Np from Eq. 13-1, we need to determine Nv
and N E· The dynamic model contains three equations
Definition. The control degrees of freedom, N FO is (NE = 3) and six process variables (Nv = 6): T8 , P8 , w, T;, T,
the number of process variables that can be controlled and Tw. Thus, Np = 6 - 3 = 3. If feed temperature T; and
independently. mass flow rate w are considered to be disturbance vari-
ables, Nn = 2 and thus Npc = 1 from Eq. 13-2. This single
degree of freedom could be used to control temperature
In order to make a clear distinction between N F and T by manipulating steam pressure, P8 •
N Fe, we refer to N F as the model degrees of freedom
and toNFe as the control degrees of freedom. They are
related by,
EXAMPLE 13.2
NF = NFe + Nv (13-2)
A conventional distillation column with a single feed
where Nv is the number of DVs. stream and two product streams is shown in Fig. 13.2. The
feed conditions are disturbance variables. Determine the
13.1.1 Control Degrees of Freedom control degrees of freedom Npc and identify potential
MVsandCVs.
The control degrees of freedom N Fe is closely related
to the number of independent MVs that are available: SOLUTION
For a typical distillation column, five input variables can
be manipulated: product flow rates, Band D, reflux flow
General Rule. For most practical control problems, rate R, coolant flow rate qc, and heating medium flow rate
the control degrees of freedom N Fe is equal to the qh· Thus, according to the General Rule, Npc = 5. This
number of independent input variables that can be result can also be obtained from Eqs. 13-1 and 13-2, but
manipulated. considerable effort is required to develop the required
dynamic model. Although five output variables could be
selected as CVs, xn, XB, hB, hn, and P, for many distillation
It is important that the manipulated inputs be inde- control problems, it is not necessary to control all five.
pendent. For example, if a process stream splits, or if Also, if it not feasible to measure the product composi-
two process streams merge to form a third stream, it is tions on-line, tray temperatures near the top and bottom
not possible to adjust all three flow rates indepen- of the column are often controlled instead, as discussed in
the next section.
dently. These situations are shown in Fig. 13.1.
238 Chapter 13 Control Strategies at the Process Unit Level

r-.;;:-"t-VCQ-- Coolant
qc

Disti Ilate
Feed------~ D
Reflux
R
xo

Heating
medium --1~c1-----,,r-,.,

qh
Figure 13.2 Schematic Bottoms
diagram of a distillation B
column. xs

Although the General Rule is simple and widely fraction, f Thus, it is not possible to compensate for sus-
applicable, there are exceptions where it is not valid. tained disturbances in x1 by adjusting f For this reason,
For example, N FC should be reduced by 1 when a the proposed control scheme is not feasible.
MV does not have a significant steady-state effect Because f does not appear in (13-4), the steady-
on any of the CVs, that is, when these steady-state state gain between x and f is zero. Thus the bypass
gains are very small. This situation is illustrated in flow rate can be adjusted, but it does not provide a
Example 13.3. control degree of freedom. However, if Wz could also
be adjusted, manipulating both f and w 2 could pro-
duce excellent control of the product composition.
EXAMPLE 13.3
The blending system in Fig. 13.3 has a bypass stream that
allows a fraction f of inlet stream Wz to bypass the stirred
tank. It is proposed that product composition x be
controlled by adjusting/via the control valve. Analyze the
feasibility of this control scheme by considering its steady-
state and dynamic characteristics. In your analysis, assume
that x1 is the principal disturbance variable and that xz, w1,
and w 2 are constant. Variations in liquid volume V can be
neglected because Wz << w1. h

SOLUTION
The dynamic characteristics of the proposed control
scheme are quite favorable because product composition x Xc X
responds rapidly to changes in the bypass flow rate. In L----~--~----L~~ w
w1 +fw2
order to evaluate the steady-state characteristics, consider
a component balance over the entire system: Figure 13.3 Blending system with bypass stream.

(13-3)
Solving for the controlled variable gives,
w1x 1 +w2x 2
x=---- (13-4) 13.1.2 Effect of Feedback Control
w
The addition of a feedback controller can change the
Thus x depends on disturbance variable x1 and four con-
control degrees of freedom, NFc· In general, adding a
stants (w 1 , w2 , x 2 and w), but it does not depend on bypass
feedback controller utilizes a control degree of freedom,
13.2 Selection of Controlled, Manipulated, and Measured Variables 239

because an MV is now adjusted by the controller. How- variable was defined to be an output variable that ex-
ever, if the controller set-point is adjusted by a higher- hibits an unbounded response after a sustained input
level (or supervisory) control system, neither NF nor change such as a step change. A common example is
NFc changes. The reason is as follows. Adding a con- liquid level in a tank that has a pump on an exit line
troller introduces a new equation, the control law, and (see Chapter 11). Non-self-regulating variables must
a new variable, the set point. Thus both N E and Nv in- be controlled in order for the controlled process to be
crease by one. But Eqs. 13-1 and 13-2 indicate that NF stable.
and N FC do not change. Guideline 2 Choose output variables that must be kept
within equipment and operating constraints (e.g., tem-
peratures, pressures, and compositions). The con-
13.2 SELECTION OF CONTROLLED, straints are due to safety, environmental, and
MANIPULATED, AND MEASURED operational requirements.
VARIABLES Guideline 3 Select output variables that are a direct
A general representation of a control problem is measure of product quality (e.g., composition, refrac-
shown in Fig. 13.4. In general, it is desirable to have at tive index) or that strongly affect it (e.g., temperature
least as many MVs as CVs. But this is not always possi- or pressure).
ble, and special types of control systems sometimes Guideline 4 Choose output variables that seriously in-
need to be utilized (see Chapter 16). It may not be fea- teract with other controlled variables. The pressure in
sible to control all of the output variables for several a steam header that supplies steam to downstream
reasons: units is a good example. If this supply pressure is not
well regulated, it will act as a significant disturbance
1. It may not be possible or economical to measure all
to downstream units.
of the outputs, especially chemical compositions.
2. There may not be enough MVs. Guideline 5 Choose output variables that have favor-
3. Potential control loops may be impractical because able dynamic and static characteristics. Output vari-
of slow dynamics, low sensitivity to the MVs, or ables that have large measurement time delays, large
interactions with other control loops. time constants, or are insensitive to the MVs are
poor choices.
In general, CVs are measured on-line, and the
measurements are used for feedback control. But Except for Guideline 1, these guidelines are not strict
sometimes it is possible to control an unmeasured CV rules. For specific situations, the guidelines may be in-
by using a process model (a soft sensor) to estimate it consistent or conflicting. For example, suppose that one
from measurements of other process variables. This output variable must be kept within specified limits for
strategy is referred to as inferential control (see safety reasons (Guideline 2), whereas a second inter-
Chapter 16). acts strongly with other output variables (Guideline 4).
Guideline 2 would prevail because of safety considera-
tions. Thus, the first output variable should be con-
13.2.1 Controlled Variables trolled if there is only a single MV.
Consideration of plant and control objectives has pro-
duced guidelines for the selection of CV s from the
available output variables (Newell and Lee, 1989). 13.2.2 Manipnlated Variables
Guideline I All variables that are not self-regulating Based on the process and control objectives, a number
must be controlled. In Chapter 5, a non-self-regulating of guidelines have been proposed for the selection of
MVs from among the input variables (Newell and Lee,
1989). Inlet or exit flow rates can be manipulated in
order to adjust mass balances and thus control CVs
Disturbance
such as liquid level and pressure. Temperatures and
variables vapor pressures are controlled by adjusting the energy
balance.
Guideline 6 Select inputs that have large effects on
Manipulated Controlled controlled variables. Ideally, an MY should have a
variables variables
significant, rapid effect on only one controlled vari-
able. In other words, the corresponding steady-state
Figure 13.4 Process with multiple inputs and multiple gain should be large. Furthermore, it is desirable that
outputs. the effects of this MV on the other CVs should be
240 Chapter 13 Control Strategies at the Process Unit Level

negligible (that is, the other steady-state gains should inferential control. It is also desirable to measure MVs
be small or zero). It is also important that each ma- because they provide useful information for tuning
nipulated variable be able to accommodate a wide controllers and troubleshooting control loops (see
range of conditions. For example, if a distillation col- Chapter 12). Measurements of DVs provide the basis
umn has a reflux ratio of 5, it will be much more for feedforward control (see Chapter 15).
effective to control the reflux drum level by In choosing sensor locations, both static and dynamic
manipulating the large reflux flow rate rather than considerations are important, as discussed in Chapter 9.
the small distillate flow rate, because larger distur-
bances in the vapor flow rate could be handled. Guideline 10 Reliable, accurate measurements are
However, the effect of this choice on the control of essential for good control. Inadequate measurements
product compositions must also be considered in are a key factor in poor process control performance.
making the final decision. Hughart and Kominek (1977) cite common measure-
ment problems that they observed in distillation-
Guideline 7 Choose inputs that rapidly affect the con-
column control applications: orifice runs without
trolled variables. For multiloop control, it is desirable
enough straight piping, analyzer sample lines with
that each manipulated variable have a rapid effect on
large time delays, temperature probes located in
its corresponding controlled variable.
insensitive regions, and flow rate measurement of
Guideline 8 The manipulated variables should affect liquids that are at, or near, their boiling points,
the controlled variables directly, rather than indi- which can lead to liquid flashing at the orifice
rectly. Compliance with this guideline usually re- plate. They note that these types of measurement
sults in a control loop with favorable static and problems can be readily resolved during the
dynamic characteristics. For example, consider the process design stage, but changing a measurement
problem of controlling the exit temperature of a location after the process is operating can be both
process stream that is heated by steam in a shell and difficult and costly.
tube heat exchanger. It is preferable to throttle the
steam flow to the heat exchanger rather than the Guideline 11 Select measurement points that have
condensate flow from the shell, because the steam an adequate degree of sensitivity. As an example,
flow rate has a more direct effect on the steam pres- consider product composition control in a tray-
sure and on the rate of heat transfer. distillation column. If the product composition cannot
be measured on-line, it is often controlled indirectly
Guideline 9 A void recycling of disturbances. As Newell
by regulating a tray temperature near that end of the
and Lee (1989) have noted, it is preferable not to
column. But for high-purity separations, the location
manipulate an inlet stream or a recycle stream, be-
of the temperature measurement point can be quite
cause disturbances tend to be propagated forward,
important. If a tray near an end of the column is se-
or recycled back, to the process. This problem can
lected, the tray temperature tends to be insensitive,
be avoided by manipulating a utility stream to ab-
because the tray composition can vary significantly,
sorb disturbances or an exit stream that allows the
even though the tray temperature changes very little.
disturbances to be passed downstream, provided
For example, suppose that an impurity in the vapor
that the exit stream changes do not unduly upset
leaving the top tray has a nominal value of 20 ppm.
downstream process units.
A feed composition change could cause the impurity
Note that these guidelines for MVs may be in con- level to change significantly (for example, from 20 to
flict. For example, a comparison of the effects of two 40 ppm) but produce only a negligible change in the
inputs on a single controlled variable could indicate tray temperature. By contrast, suppose that the tem-
that one has a larger steady-state gain (Guideline 6) perature measurement point were moved to a tray
but slower dynamics (Guideline 7). In this situation, a that is closer to the feed tray. Then the temperature
trade-off between static and dynamic considerations sensitivity is improved because the impurity level is
must be made in selecting the appropriate manipulated higher, but disturbances entering the column at ei-
variable from the two candidates. ther end (e.g., from the condenser or the reboiler)
would not be detected as quickly.
Guideline 12 Select measurement points that mini-
13.2.3 Measured Variables
mize time delays and time constants. Reducing time
Safe, efficient operation of processing plants requires delays and time constants associated with mea-
on-line measurement of key process variables. Clearly, surements improves closed-loop stability and re-
the CVs should be measured. Other output variables sponse characteristics. Hughart and Kominek (1977)
can be measured to provide additional information have observed distillation columns with the sample
or for use in model-based control schemes such as connection for the bottom analyzer located 200 ft
13.2 Selection of Controlled, Manipulated, and Measured Variables 241

downstream from the column. This large distance in-


temperature T and could shift the boiling regime from
troduced a significant time delay and made the col- film boiling to nucleate boiling, or vice versa. This type
umn difficult to control, particularly because the of regime shift could produce a major process upset. For
time delay varied with the bottom flow rate. these reasons, three CVs are selected: xs, h, and P.
Next we select the MVs. Because the feed conditions
An evaporator control problem will now be used to
cannot be adjusted, the obvious MVs are B, D, and Ps.
illustrate the Guidelines.
Product flow rate B has a significant effect on h, but
relatively small effects on P and xs. Therefore, it is
reasonable to control h by manipulating B (Guideline 6)
unless B is only a small fraction of F (for example, less
EXAMPLE 13.4 than 10% ). In this latter case, it would be desirable to
have Fbecome an MV. Vapor flow rateD has a direct and
The evaporator shown in Fig. 13.5 is used to concentrate a rapid effect on P but has less direct effects on h and xs.
dilute solution of a single, nonvolatile solute in a volatile Thus, P should be paired with D (Guideline 6). This leaves
solvent by evaporating solvent using heat supplied by a the Ps-XB pairing for the third control loop. This pairing is
steam coil. Three process variables can be manipulated: physically reasonable, because the most direct way of
steam pressure, Ps, product flow rate, B, and vapor flow regulating xs is by adjusting the evaporation of solvent via
rate of solvent, D. The chief DVs are feed composition, the steam pressure (Guideline 8).
xF and feed flow rate, F. The compositions are expressed
Finally, we consider which process variables to measure.
as' mole fractions of solute, and the flow rates are in Clearly, the three CVs should be measured. It is also
molar units. desirable to measure the three MVs because this information
Propose multiloop control strategies for two situations: is useful for controller tuning and troubleshooting. If large
(a) The product composition xs can be measured on-line and frequent feed disturbances occur, measurements of
disturbance variables F and xF could be used in a
(b) xs cannot be measured on-line
feedforward control strategy that would complement the
feedback control scheme. It is not necessary to measure
SOLUTION TF because sensible heat changes in the feed stream
Case (a): Product Composition x8 Is Measured On-Line
ar~ typically small compared to the heat fluxes in the
evaporator.
First, we select the CVs. Because the chief objective for A schematic diagram of the controlled evaporator for
an evaporator is to produce a product stream with a Case (a) is shown in Figure 13.6.
specified composition, mole fraction xs is the primary
CV (Guideline 3). Liquid level h must be controlled be-
Case (b): Product Composition Cannot Be Measured
cause of operating constraints and safety considerations
(Guideline 2). If the level is too high, liquid could be en- On-Line
trained in the solvent stream; if the level is too low, the The CVs are the same as in Case (a), but, because the
tubes of the steam chest would be exposed to vapor, third controlled variable xs cannot be measured, standard
rather than liquid, a potentially dangerous situation. In feedback control is not possible. A simple feedforward
this latter situation, the heat transfer rate from the steam control strategy can be developed based on a steady-state
to the evaporator liquid would be significantly lower, component balance for the solute,
and thus overheating and damage to the steam chest
could result. Pressure P should also be controlled, be-
o= FxF- Bxs (13-5)
cause it has a major influence on the evaporator opera- where the bar denotes the nominal steady-state value.
tion (Guideline 2). Large pressure variations affect the Rearranging gives,
- -XF
Solvent B=F- (13-6)
.-----~D. xn = 0, T xs
Equation 13-6 provides the basis for the feedforward control
law. Replacing B and F by the actual flow rates, B(t) and
P, T,p F(t), and replacing xs by the set-point value, Xssp• gives

B(t) = F(t) XF (13-7)


Ps XBsp
Steam _.....:;..-+-'7
h
Product Thus B is adjusted based on the measured value of F,
B,x8 , T the set point XBsp• and the nominal value of the feed
composition, XF.
The MVs are the same as for Case (a): D, B, and Ps.
Bottom flow rate B has already been used in the
Figure 13.5 Schematic diagram of an evaporator. feedforward control strategy of (13-7). Clearly, the P-D
242 Chapter 13 Control Strategies at the Process Unit Level

~---
1

,...--- ---------------~
1
I
I
I
I
I
I

$
I

~
h

I
I I
I
I
Feed AT
F, xf, Tp

Figure 13.6 Evaporator control strategy


'---------1/'<J-----'----'~ Product
for Case (a). B,xB

pairing is still desirable for the reasons given for Case (a). composition is constant at a known steady-state value.
This leaves h to be controlled by adjusting the rate of Second, because the feedforward control technique was
evaporation via Ps. A schematic diagram of the controlled based on a steady-state analysis, it may not perform well
evaporator is shown in Fig. 13.7. during transient conditions. Nevertheless, this scheme
This control strategy has two disadvantages. First, it is provides a simple, indirect method for controlling a
based on the assumption that the unmeasured feed product composition when it cannot be measured.

~---
1

-----------~

I
I
I
I
I

--~
h

---------~

Feed forward
controller

Figure 13.7 Evaporator control strategy for Feed


Case (b). F, xr,Tp
13.3 Applications 243

13.3 APPLICATIONS knowledge of the static and dynamic behavior of


the process. Advanced control strategies are con-
In this section, we describe four representative exam- sidered in Chapters 16, 18, and 20.
ples of control problems at the process unit level,
rather than at the individual control loop level, in order (d) Pairing of MVs and CVs. If a multiloop control
to provide an introduction to more complex control strategy is selected, the next step is to deter-
problems. For each of these case studies, key aspects of mine how the CVs and MVs should be paired.
their control system design are considered: A systematic method for making these deci-
sions, the Relative Gain Method, is considered
(a) Process objectives. For control system design, it in Chapter 18.
is essential to know the process objectives. For
simple processes, the process objectives are
fairly obvious. But for others, they may not be.
13.3.1 Distillation Column
For example, a chemical reactor can be oper-
ated to maximize the yield, selectivity, or For continuous distillation, the primary process ob-
throughput subject to satisfying process con- jective is to separate a feed mixture into two (or
straints (e.g., safety and the environmental con- more) product streams with specified compositions.
straints.) Similarly, a distillation column can be Thus the product compositions are the most impor-
operated to maximize throughput or minimize tant CVs. For some distillation columns, one product
energy consumption, while satisfying product composition is much more important than the other.
specifications and other constraints. For example, consider a series of columns where the
(b) Control objectives. The control objectives should bottom stream of a column serves as the feed stream
be carefully formulated based on a number of to the next column. The distillate composition for
considerations that include process objectives, each column is more important because it is a product
process constraints, and economic data. Even stream (Guideline 3). By contrast, the bottom stream
for simple control problems, there can be alter- for each column (except the last column in the series)
native control objectives. For example, consider undergoes further separation, so the bottom composi-
a very common control application, liquid-level tions are of less concern. Consequently, in these situa-
control. In some applications, the control objec- tions, the bottom compositions may not have to be
tive is to achieve tight level control at a specified controlled.
set point. This situation might occur for a con- In addition to one or more product compositions,
tinuous bioreactor, when maintaining a constant other process variables need to be controlled. Con-
residence time is important. On the other hand, sider the separation of a binary mixture and the con-
many process vessels are used as intermediate ventional tray-distillation column shown in Fig. 13.2.
storage tanks for surge control. Here, the Assume that the chief control objective is to control
process objective is to reduce the effect of up- both product compositions, xv and xB. However, the
stream disturbances on downstream units, by liquid levels in the reflux drum, hv and the column
having the exit stream from an intermediate base (or sump), hB, must be kept b~tween upper and
storage tank change gradually in response to lower limits (Guideline 2). The column pressure, P,
large, rapid changes in its inlet steams. In this must also be controlled in order to avoid weeping or
situation, tight level control would be undesir- flooding in the column and to control the vapor in-
able, because inlet flow rate disturbances ventory in the column. Thus, this column has a total
would be propagated to the outlet stream. of five CVs.
The more appropriate control objective The MVs are selected from among six input vari-
would be averaging control, in which the liq- ables: feed flow rate F, product flow rates, D and
uid level is allowed to vary between specified B, reflux flow rateR, and the heat duties for the con-
upper and lower limits, thus providing surge denser and reboiler, qv and qB. If the feed stream
capacity and more gradual changes in the exit comes from an upstream process, instead of from a
flow rate. storage tank, it cannot be manipulated, and thus F
is considered to be a DV. In this situation, there are
(c) Choice of control configuration. A key decision in five MVs.
control system design is to decide whether a con- Distillation column control can be difficult for the
ventional multiloop control strategy, consisting of following reasons.
individual feedback control loops, will provide
satisfactory control. If not, an advanced process 1. There can be significant interaction between
control strategy is required. This decision should process variables. One important example is that
be based primarily on the control objectives and changing a single MV can have significant effects
244 Chapter 13 Control Strategies at the Process Unit Level

on many CVs. For example, increasing heat duty 13.3.2 Fired-Tube Furnace
q8 by increasing the steam flow rate causes more
Fired-tube furnaces (or heaters) are widely used in the
liquid to be boiled and thus increases the vapor
process industries to heat process streams and to
flow in the column. Consequently, the q 8 increase
"crack" high-molecular-weight hydrocarbon feeds, in
causes sump level h8 , pressure P, and bottom
order to produce more valuable lower-molecular-
composition x 8 to change rather quickly (Guide-
line 7). However, the increase in q 8 also affects weight compounds. In this case study, we consider a
fired-tube furnace used to heat a liquid hydrocarbon
reflux drum level hv and distillate composition xv
feed steam that passes through the furnace in a set of
more slowly, after the increased vapor flow
tubes. A simplified schematic diagram is shown in
reaches the top of the column (Guideline 8).
Fig. 13.8. The combustion of the fuel gas (FG) generates
Similarly, changes in R or D affect hv and xv
heat, which is transferred to the hydrocarbon (HC). The
rather quickly and h8 and x 8 more slowly. Other
major gaseous combustion reactions in the furnace are
interactions arise when the hot bottom stream
from the column is used to heat the cold feed 3
stream in a bottom-feed heat exchanger, in order CH4 + 2 0 2 ~ CO + 2H20
to reduce energy consumption. 1
2. The column behavior can be very nonlinear, espe- C0+20z~COz
cially for high-purity separations. For example,
the amount of effort required to reduce an impu- A fired-tube furnace is one of the case studies in the
rity level in a product composition from 5% to 4% Process Control Modules (PCM) in Appendix E. The
is typically much less than the effort required to PCM furnace model is a nonlinear state-space model
reduce it from 1.5% to 0.5%. that consists of 26 nonlinear ordinary differential equa-
tions based on conservation equations and reaction
3. Distillation colunms often have very slow dynamics. rate expressions for combustion (Doyle et al., 1998).
The dominant time constants can be several The key process variables for the furnace model are
hours, or even longer, and long time delays are listed in Table 13.1.
also common. Because slow dynamics result in Important dynamic characteristics of the furnace
long response times with feedback control, the model include the different time scales associated with
addition of feedforward control can be very mass and energy transfer, the nonlinear behavior of
advantageous. the model, time delays, and the process interactions
4. Process constraints are important. The most prof- between the input and output variables. The term
itable operating conditions typically occur when process interaction means that changes in an input vari-
some MVs and CVs are at upper or lower limits. able affect more than one output variable. For exam-
For example, maximum separation, or maximum ple, the step responses in Fig. 13.9 illustrate that a step
recovery of a valuable feed component, often change greater than 20% in the inlet air temperature
occurs for maximum reboiler heating or condenser affects three of the four output variables, and their cor-
cooling. responding response times are quite different.
5. Product compositions are often not measured.
Although product compositions are the primary
Flue gas
CVs, their on-line measurement is often difficult,
expensive, and costly to maintain. Consequently,
tray or product stream temperatures are com-
monly measured and controlled as proxies for
product compositions. This strategy is easier to
implement but makes tight composition control
more difficult.
Another major complication is that there are many
different column configurations, especially for reboilers
and condensers, and many alternative process and con-
trol objectives. Consequently, each column control Air
application tends to be different and to require individual
analysis. Fortunately, there is an extensive literature
available on both the practical (Shinskey, 1984; Luyben.,
Fuel gas
1992) and theoretical (Skogestad, 1997) aspects of dis-
tillation column control. Figure 13.8 Schematic diagram of a tube-fired furnace.
13.3 Applications 245

Table 13.1 key process variables for the PCM furnace module
Measured Output Variables Disturbance Variables (DVs) Manipulated Variables {MVs)
HC outlet temperature HC inlet temperature Air flow rate
Furnace temperature HCflow rate FG flow rate
Flue gas (or exhaust gas) flow rate Inlet air temperature
0 2 exit concentration FG temperature
FG purity {CH4 concentration)

The control objectives for the furnace are the value and thus upset the combustion process and heat
following: generation.
Conventional furnace control strategies involve both
1. To heat the hydrocarbon stream to a desired exit
feedforward and feedback aspects (Liptak, 2003,
temperature
Shinskey, 1996). The HC exit temperature can be
2. To avoid unsafe conditions resulting from the
controlled by adjusting either the FG flow rate or FG
interruption of fuel gas or hydrocarbon feed
pressure. The 0 2 exit concentration is controlled by
3. To operate the furnace economically by maintain-
adjusting the furnace draft, i.e., the difference between
ing an optimum air-fuel ratio
air inlet and outlet pressures, by changing either the
Because the furnace model has two MVs, two CVs inlet air flow rate or the damper in the furnace stack.
should be specified. Of the four measured outputs in The air-fuel ratio can be controlled using a special type
Table 13.1, the most important are the primary CV, HC of feedforward control referred to as ratio control (see
outlet temperature, and the 0 2 exit concentration in Chapter 15). The measured HC inlet flow rate can also
the flue gas. The latter provides a good indication of be used as a measured disturbance for feedforward con-
the combustion efficiency of the furnace. A very low 0 2 trol. The PCM include advanced model-based control
measurement indicates that the FG combustion is strategies for the furnace, including decoupling (Chap-
incomplete; a very high measurement indicates excess ter 18) and model predictive control (Chapter 20).
air and thus low furnace efficiency. A high furnace Safety considerations are a primary concern for fur-
efficiency strongly depends on maintaining the optimum nace operation because of the large amount of com-
air-fuel ratio. For these reasons, the HC outlet temper- bustible material that is present. In particular, it is
ature and the 0 2 exit concentration in the flue gas are important to ensure that unreacted FG is not allowed
selected to be the CVs (Guideline 3). to accumulate. This unsafe condition can result if the
The chief DV is the FG composition, which can air-fuel ratio is too low or if burner flameout occurs
vary significantly depending on the source of the fuel because of a FG interruption. Safety interlocks (see
gas. Large composition changes affect the FG heating Chapter 10) are used to shut off the fuel gas in these

626~
618

610 o 10 20 30 40 50 60 70 80 90 100

1480~
1460

1440 o 10 20 30 40 50 60 70 80 90 100

o~:~j
(.)
c ~
O"'
u E
~:::,

~ N~
E
0.86L-----~-------L------~------L-----~-------L------~------L-----~------~
0
0 10 20 30 40 50 60 70 80 90 100
Time (min)

Figure 13.9 Step response to a + 20% step change in inlet air temperature at t = 30 min.
246 Chapter 13 Control Strategies at the Process Unit Level

situations. Interruption of the feed stream also poses a


serious hazard, because it can result in overheating and
possible rupture of tubes in the furnace (Liptak, 2003).
Thus, an interlock shuts off the fuel gas if a low flow
alarm occurs for the feed flow rate.
For additional information on furnace and heater
control problems, see the books by Shinskey (1996)
and the Liptak (2003).

13.3.3 Catalytic Converters for Automobiles


In many urbanized areas of the world, automobiles are Figure 13.10 TWC efficiency as a function of air-to-fuel ratio
the single greatest producer of harmful vehicle exhaust (Guzzella, 2008).
emissions. For over 30 years, catalytic converters have
been used to significantly reduce harmful exhaust and the desired reduction reaction is:
emissions from internal combustion engines, especially
2NOx-xOz + Nz
automobiles. In North America, automobiles with
standard gasoline engines manufactured since 2004 are The catalytic converter is most effective when the au-
required to have three-way catalytic (TWC) converters. tomobile engine operates with an air-to-fuel ratio (A/F)
This section presents an overview of control issues and that is slightly above the stoichiometric ratio of 1/14.7 for
control strategies associated with TWC. More detailed gasoline. A normalized air-to-fuel ratio A is defined as:
information is available elsewhere (Fiengo et al., 2005;
Wair 1
Balenovic et al., 2006; Guzzella, 2008). A=-- (13-8)
Three-way catalytic converters (TWC) are designed Wfuel 14.7
to reduce three types of harmful automobile emissions: where Wair is the mass flow rate of air, and Wfuel is the
carbon monoxide (CO), unburned hydrocarbons in mass flow rate of fuel. The pollutant removal efficiencies
the fuel (HC), and nitrogen oxides (NOx)· The term for the three pollutants vary strongly with air-to-fuel
nitrogen oxides refers to both N0 2 and NO. The TWC ratio, as shown in Fig. 13.10. For A ~ 1, the three pollu-
accomplishes these tasks using precious metal catalysts tants are essentially eliminated, with over 98% re-
(platinum, palladium, and rhodium) for chemical reac- moval. When A> 1, there is excess 0 2 , and the engine
tions that take place at high temperatures (e.g., is said to be running lean. For these conditions, the oxi-
1000-1600°F) and short residence times (~0.05 s). dation reactions are favored, and excessive amounts of
The desired TWC oxidation reactions are (Schmidt, NOx are emitted. Conversely, when A< 1, the engine is
2005), said to be running rich. Here, the reduction reactions

CnH2n+2+ ( -3n2-+ 1) Oz-nCOz + (n+1)Hz0


are favored, and large amounts of hydrocarbons and
CO are emitted. The TWC has the capacity to store
oxygen for the oxidation reactions, when the engine is
1 running lean. From Fig. 13.10 and these considerations,
CO +20 2 -C0 2
it is evident that the desired value of A/F is slightly

Figure 13.11 Block diagram for the three way catalytic converter control system.
13.3 Applications 247

greater than stoichiometric, or, equivalently, A. should If the A/F ratio is rich, unburned fuel from the engine
be slightly greater than 1. undergoes combustion in the TWC, which can raise the
A general representation of a TWC control strategy TWC exit temperature to several hundred degrees above
is shown in the block diagram of Fig. 13.11. The A/F is the inlet temperature. Consequently, temperature sen-
measured both upstream, (A/F)u, and downstream sors located before and after the TWC can provide useful
(A/F)ct, of the TWC, using 0 2 sensors (also called diagnostic information (Guideline 11). If the difference
lambda sensors). Based on the A/F measurements and in temperature measurements is unusually large, it indi-
the desired value, (A/F)sp' the feedback controller cal- cates that rich conditions occur. On the other hand, if the
culates an appropriate output signal u that adjusts the difference is essentially zero, the TWC has stopped func-
fuel injection system for the engine (Guidelines 6-8). tioning (e.g., as a result of catalyst poisoning).
Sometimes, the two A/F measurements are used in a As emission standards for automobiles become tighter,
cascade control configuration, a topic that is considered improved closed-loop TWC control strategies become
in Chapter 16. The static and dynamic behavior of the even more critical. The development of advanced TWC
TWC varies with the operating conditions (e.g., engine control strategies includes custom model-based methods
load) and aging of the components, including the 0 2 (Fiengo et al., 2005; Balenovic et al., 2006; Guzzella,
sensors. Thus automatic adjustment of the controller 2008).
settings (adaptive control) is a promising approach
(Guzzella, 2008).
13.3.4 Plasma Etching in Semiconductor
Many TWC control systems are operated so that A/F
Processing
rapidly alternates between being slightly rich and
slightly lean (A. = 1 ± 0.05) to ensure that the reduction Solid-state devices are manufactured on circular disks
catalyst (rhodium) does not become overloaded and of semiconducting material called wafers (Edgar et al.,
that the oxidation catalysts (platinum and palladium) 2000). These devices are three-dimensional structures
do not become oxygen-starved. The switching time be- made up of stacked layers. Each layer is typically man-
tween the two modes is very small, less than a second. ufactured in batch operations, such as deposition and
The switching strategy can be implemented by cycling etching. The purpose of deposition is to grow a thin
the set-point, (A/F)sp· layer of a specific material on the wafer surface. In
The performance of a TWC is strongly affected by its etching, part of the layer is removed chemically, using
temperature, as well as the A/F value. The TWC does gases such as CF4 and HF. Etching can remove silicon
not begin to operate properly until it heats up to ap- dioxide, silicon nitride, polysilicon, aluminum, photore-
proximately 550°F; efficient operation does not occur sist, and other thin film materials. It creates the final
until the temperature reaches about 750°F. Conse- layer definition by transforming a single layer of semi-
quently, a significant amount of emissions occur during conductor material into the patterns, features, lines,
cold starts of the engine. This problem can be alleviated and interconnects that make up an integrated circuit.
by the addition of an electrical heater that can heat the The polysilicon (poly) gate etch process is shown
TWC prior to cold starts. The TWC can operate properly schematically in Fig. 13.12. Photoresist (PR) etching and
up to sustained temperatures of 1500°F. polysilicon etching are the most critical batch steps for

Figure 13.12 Inputs and


outputs for polysilicon gate
etch process in semicon-
ductor manufacturing. The
measured inputs (CDin
and ein) in the incoming
wafer can be used in
feedforward control, while
the measured outputs
(CDout and eout) are used in
feedback control. BARC is
bottom anti-reflective
coating.
248 Chapter 13 Control Strategies at the Process Unit Level

creating the profile of polysilicon (side views are shown pressure, plasma power, and flow rates of gases such as
in Fig. 13.12). Photoresist etching entails isotropic etch- N 2 , 0 2 , and Cl2 . Steady-state nonlinear models can be
ing of the top layer of photoresist, which determines the obtained from experimental test wafers by specifying
critical dimension (CD), or width, of polysilicon. This the inputs and measuring each CV; the data can then
step is followed by polysilicon etching, which is be fitted using polynomial models as the input-output
anisotropic (etches in a single downward direction); the relationships. These models also allow the process gain
final profile of polysilicon is determined in this step. to be calculated for each input-output pair.
The etching process can be used to illustrate the appli- A controller determines the set of input variables
cation of Guidelines 3, 6, 8, and 10 from Section 13.2. For (known as the etch recipe) that keep CD, e, and unifor-
Guideline 3, the key CVs in plasma etching, CD and e mity as close as possible to their targets while satisfying
(sidewall angle), are shown in Fig. 13.12. The CD affects MV constraints. Consistent with Guideline 10, inte-
transistor speed, which is the most important electrical grated metrology (IM), shown in Fig. 13.12, uses opti-
property of a logic chip (a product quality variable). Ide- cal techniques such as ellipsometry or scatterometry to
ally, e should be goo, but a target of 87° represents a measure the incoming wafer profile ( CDin and ein) at
trade-off between 8 and CD because of the interactions multiple sites. IM then sends the measurements to a
between the variables. Attempting to control e closer to computer that calculates the values of the MVs for the
goo causes the CD to move further from the target. The batch. At the end of the etch process, the output CVs
uniformity of the CD over the wafer is a third CV af- for the batch are measured using IM. The errors for the
fected by the inputs. Excessive nonuniformity makes the CVs are calculated and used to adjust the control strat-
wafer lower quality because of chip inconsistency. egy (Parkinson et al., 2010).
A plasma etcher has a number of MVs that can be Advanced control strategies for microelectronics ap-
adjusted in order to achieve the desired chip geometry. plications such as including plasma etching are discussed
By applying Guidelines 6 and 8, several input variables elsewhere (Edgar et al., 2000; Moyne et al., 2001). Batch
can be selected from the four possible MVs: etch time, process control is discussed in Chapter 22.

SUMMARY
This chapter has considered two important issues in selection of the controlled, manipulated, and measured
control system design. The first issue was that the con- variables, a key step in the control system design.
trol system design is strongly influenced by the control These choices should be based on the guidelines pre-
degrees of freedom that are available, N FC· In most sit- sented in Section 13.2.
uations, Npc is simply the number of process variables The chapter concluded with four case studies that il-
that can be manipulated. In general, N FC < N p, where lustrated control problems at the process-unit level,
Np is the model degrees of freedom that was intro- rather than at the individual control-loop level.
duced in Chapter 2. The second issue concerned the

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