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2. �a) Find gm and r�s for an n channel transistor with Vgs =1.2V,Vtn =0.8V,�W/L)
=10;µn Cox =92 µ A/V 2 and V�s =Vef f +0.5V, the output impedance constant
λ = 95�3 � 10�3 /V �� .
�b) Explain figure of merit of MOS transistor. [8+8]
3. �a) what is a stick diagram? Draw the stick diagram and layout for a CMOS
inverter.
�b) What are the effects of scaling on Vt ?
�c) What are design rules? Why is metal- metal spacing larger than poly -poly
spacing. [8+4+4]
4. �a) For a 5µm technology,the standard unit of capacitances for metal 1,polysilicon
and n-diffusion are 0.0075 Cg , 0.1 Cg and 0.25 Cg respectively. Calculate
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the capacitances for area shown in figure 4. Consider same area for calculation.
i. metal
ii. polysilicon
iii. n-diffusion.
�b) Impliment a 3-input NOR gate in dynamic logic and explain its operation.
[8+8]
Figure 4
5. �a) Explain the CMOS system design based on the control structures with suitable
example.
�b) What are the different types of Memory elements? Compare them with respect
to CMOS design. [8+8]
6. �a) Draw a self timed dynamic PLA and what are the advantages of it compared
to footed dynamic PLA.
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�b) What are the basic sources of errors in CMOS circuits and how these are
tested? Give name of such a simulator. [8+8]
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�c) BiCMOS drivers. [8+4+4]
5. �a) Explain the CMOS system design based on the data path operators with a
suitable example.
�b) Draw and explain the basic Memory- chip architecture. [8+8]
6. �a) Compare the Antifuse and Vialink programmable interconnections for PAL
devices.
�b) What are different typically available SSI Standard-cell types and compare
them. [8+8]
7. �a) What are the design styles of VHDL and explain them with suitable examples?
�b) Explain the method of Timing simulation for CMOS circuits and name such
simulators. [8+8]
8. �a) Explain the gate level and function level of testing.
�b) A sequential circuit with ?n? inputs and ‘m’ storage devices. To test this
circuit how many test vectors are required.
�c) What is sequential fault grading? Explain how it is analyzed. [6+4+6]
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Time: 3 hours Max Marks: 80
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1. Mention different growth technologies of thin oxides and describe any one technique
in detail. [16]
3. Draw the CMOS representation stick diagram and layout for a two Input EX-NOR
gate. [16]
4. Calculate the rise time and fall time of the CMOS inverter �W�L)n = 6 and �W�L)p =8,
Kn� =150µ A/V � , Vtn =0.7V,Kp� = 62 µ A/V � , Vtp =-0.85V , V�� =3.3V. Total out-
put capacitance =150 fF. [16]
5. �a) Draw and explain the Booth decode cell used for Booth multiplier.
�b) Compare different types of CMOS subsystem shifters. [8+8]
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6. Draw the structure, explain the function and write the applications characteristics
of the following programmable CMOS devices: [16]
�a) PLA
�b) PAL
�c) FPGA
�d) CPLD.
7. �a) Explain how a FSM model is described in VHDL with suitable program.
�b) What is the difference between Design capture tools and design verification
tools? Give some examples of each. [8+8]
8. �a) Explain how the cost of chip can effect with the testing levels,
�b) Explain how observability is used to test the output of a gate within a larger
circuit.
�c) How the Iterative Logic Array Testing can be reduced number of tests. [5+6+5]
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tiplier.
�b) Draw the circuit and layout for ROM and explain how the dynamic power
dissipation is minimized. [8+8]
6. �a) Draw the typical standard-cell structure showing low-power cell and explain
it.
�b) Sketch a diagram for two input XOR using PLA and explain its operation
with the help of truth table. [8+8]
7. �a) What is the importance of operator precedence in VHDL? Is the AND oper-
ation takes place before OR operation?
�b) What is mean by Hierarchy in VHDL? Write a program for 4 input multiplexer
from 2 input multiplexers. [8+8]
8. �a) Explain how the cost of chip can effect with the testing levels,
�b) Explain how observability is used to test the output of a gate within a larger
circuit.
�c) How the Iterative Logic Array Testing can be reduced number of tests. [5+6+5]
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