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Article history:
Received 2 February 2009
Received in revised form 10 March 2009
Accepted 16 March 2009
Available online 27 March 2009
Keywords:
Micromixer
Microfabrication
Passive mixing
Elongational ow
CFD
Residence time distribution
a b s t r a c t
Improvement of mixing quality in microchannel mixers or reactors has been recognized as a relevant
technical issue critical to the development and application of integrated microchemical processing systems. Silicon micro-electromechanical systems (MEMS) technology was successfully used to fabricate
a novel multichannel micromixer. This improved micromixer design basically used the mechanisms of
uid multilamination, elongational ow, and geometric focusing for mixing enhancement. The fabricated
triple-stack (PyrexTM /silicon/PyrexTM ) multilaminated/elongational ow micromixer (herein referred to
as MEFM-4) was evaluated for its mixing performance using residence time distribution (RTD) measure
in conjunction with UVvis absorption spectroscopy detection technique. Using a semi-empirical model
and the so-called convolutiondeconvolution theorem, a model description of the experimental RTD data
was obtained for the ow/mixing unit. This result was compared with numerical RTD predictions based
on computational uid dynamics (CFD) simulations. The simulation results are in good agreement with
the experimental data, especially in the low ow-rate range (Reynolds number <13 in this study). However, as expected, the accuracy of the CFD simulations is generally limited at higher ow rates (high Peclet
number) because of unavoidable numerical diffusion. This paper describes the efcient design, fabrication
and characterization of an effective microchannel mixer for microchemical systems applications.
2009 Elsevier B.V. All rights reserved.
1. Introduction
Mixing in microchannel mixers or reactors is one of the
key scientic issues that need to be fundamentally understood and technically addressed for microchemical systems to
take full advantage of their established and potential benets.
The microchannel-based process devices possess extremely high
surface-to-volume ratio (e.g. 40,000 m2 per 1 m3 in principle for
a simple rectangular channel with a cross-section of 100 m by
100 m), because of their small linear dimensions, a characteristic
from which derives most of their advantages over conventional-size
chemical process equipment. These advantages include high heat
and mass transfer rates (with shorter residence time) that enable
reactions to be performed under hitherto aggressive conditions
with higher yields and greater selectivity. Other key advantages
demonstrated or envisioned for certain applications of miniaturized chemical systems are: processing and hold-up safety for
extremely hazardous or toxic chemicals [1,2]; on-demand/on-site
synthesis of some critical chemicals such as H2 O2 [3]; better process control for effective processes/materials screening [4], easier
Corresponding author. Tel.: +1 201 216 5539; fax: +1 201 216 8306.
E-mail addresses: jadeosun@stevens.edu, jtadeosun@yahoo.com (J.T. Adeosun).
0925-4005/$ see front matter 2009 Elsevier B.V. All rights reserved.
doi:10.1016/j.snb.2009.03.037
638
for mixing enhancement. For passive or static mixers, the inherently high surface-to-volume ratio (with the associated high mass
transfer rate) in microscale mixer/reactor is generally made effective for mixing enhancement by engineering or manipulating the
geometrical channels and ow structures within this microscale
environment. Therefore, it is the technical know-how of imposing the needed geometric constraints with the associated mixing
mechanisms that distinguishes the mixing performance of one
micromixer from another.
The purpose of this research work is to design and characterize
the mixing behavior of a passive multilaminated/elongational ow
micromixer using both numerical and experimental approaches.
This work involves: using computational uid dynamics (CFD)
simulations as a vital design, optimization and characterization
tool; fabricating the mixing unit using silicon-MEMS technology;
and performing experiments to validate the numerical predictions
of the mixing characterization. In the present work, the proposed silicon-based multilaminated/elongational ow micromixer
combines at least three mixing mechanisms (discussed later in Section 2.1) for mixing enhancement. The numerical simulations and
experimental validations were performed using residence time distribution (RTD) as measure to characterize ow/mixing behavior
in the mixing-enhanced conguration. It is worth noting that the
choice and application of suitable characterization technique(s) for
the evaluation of mixing behavior in microchannels still pose some
challenges [8,16] that also need to be addressed.
Various mixing characterization measures/methods such as
ow visualization of test solutions (containing a chemical indicator)
and imaging [15,17], RTD [1820], and test chemical reactions (such
as VillermauxDushman competing parallel reactions) [5,21]
have been used by investigators to characterize theoretically and/or
experimentally the degree of mixing in microuidic devices. Some
of the characterization measures have been found particularly suitable for the qualitative analysis of mixing [17,21], but its application
to generate quantitative data for objective characterization of mixing can be limited by insufcient sensitivity of the test solutions and
the low local resolution of instrumentation [5]. The most desirable
characterization measures/methods should be those that not only
provide qualitative information for the comparisons of micromixers but also reliable quantitative data for direct characterization of
different micromixers.
The RTD measure chosen for this work, although a wellknown method [22] for characterizing ow and mixing behavior in
macromixers/reactors, is still a novel technique for the characterization of mixing in micromixers/reactors [1820,23]. By performing
the so-called tracer or stimulusresponse experiments, RTD data
that can be used for ow and mixing evaluation in continuous ow
systems can be obtained. The RTD data obtained from tracer experiments can be used directly or in combination with ow models
(depending on the ow system boundary conditions) to predict performance of non-ideal ow mixers/reactors. In the present study,
the RTD data were used in combination with a semi-empirical
RTD model to predict the ow/mixing behavior of the studied
micromixer. In the context of microchannels for low Re laminar
ow, the application of CFD tools in RTD studies becomes especially
useful when experimental RTD data can be obtained for comparison
and validation purposes.
The CFD tools have been effectively applied in our prior simulation studies [20,24] and by other researchers [2529] for
investigating ow and mixing behavior in microchannels for singleand multi-phase systems. These tools were used in our work
to obtain solutions to three-dimensional ow and mass transport equations, from which numerical RTD data were extracted.
A commercially available nite volume-based CFD software package, FLUENT , was used for our simulations, while all the other
numerical processing steps including numerical integration of
639
Fig. 2. Model-based MEFM-4 with manifold design: (a) the frontside and (b) the
backside.
The fabrication of our proposed MEFM-4 was successfully completed using the state-of-the-art equipment at Cornell NanoScale
Science and Technology Facility (CNF). The microuidic mixing unit
was made from silicon and PyrexTM using MEMS microfabrication technology and the associated microchannel fabrication and
packaging methods [31,32]. Specically applying silicon bulk micromachining techniques, which involve two main fabrication steps
namely photo-lithography (hereafter, lithography) and deep reactive ion etching (DRIE), the desired channels and structures were
created on both sides of a double-side polished silicon wafer (ptype 1 0 0 4-in. diameter, 800-m thick). The fabrication process
employed three steps of lithography and DRIE each in a predetermined sequence to ensure perfect back-to-frontside-alignment and
etching of the ow-through structures in MEFM-4 (see Fig. 2). As
expected, this alignment along with the associated etching process
was the most challenging requirement for the successful fabrication
of MEFM-4. The DRIE recipe enabled by inductively coupled plasma
(ICP) was utilized for the deep etching (with vertical walls) of the
mixing channels, manifold structures, and critical four through
holes in the MEFM-4. The mixing channels (on the frontside) and
the manifolds (on both the frontside and backside) were etched to
a depth of 300 m while the four ow-through holes (each with
a cross-sectional dimension of 200 m by 500 m) were etchedthrough from the backside of the 800-m thick wafer. More details
on the lithography and DRIE steps are described next.
For the required lithography steps, the CAD layouts of the
frontside and backside of MEFM-4 (with suitable alignment
marks) were rst transferred using an optical-pattern generator (GCA/MANN PG 3600F) and a mask-develop-etch equipment
(Hamatech HMP 900) to three 5-in.2 chrome-coated glass masks.
These three glass masks are herein referred to as M1 (comprising
the backside manifold pattern), M2 (comprising the pattern for the
four ow-through holes, inlet hole/opening to the backside manifold, inlet ow-through hole to the frontside manifold, and outlet
ow-through hole), and M3 (comprising the pattern for the channels and manifolds on the frontside). Fig. 3 shows the major steps
that are involved in the fabrication of MEFM-4. The schematic gures show basically the cross-section where the four through-holes
are located with the cross-section for the inlet and outlet holes on
MEFM-4 (see Fig. 2a). These steps are described herein fully. The
silicon wafer was initially coated (using thermal oxidation furnace)
with 2-m thick silicon dioxide, which would act as hard mask
needed later for the second DRIE step. In the rst lithographic step,
the pattern on the rst mask (M1) was transferred to the backside of
silicon/silicon-dioxide wafer (earlier spin-coated with a thick positive photoresist) by exposing the mask to UV light via a contact
aligner (EV 620). The oxide in the developed photoresist (PR) area
on the patterned wafer was then removed using a dielectric etcher
(Oxford 100). The PR on the wafer surface was stripped off using
two hot PR-stripper baths. The second mask (M2) was used in the
next lithographic step with the above lithography process repeated
on the backside of the wafer without removing the PR on the wafer
surface as in the last step above. The exposed silicon area (on the
wafer backside) was then etched to a depth of 200 m using DRIE
by inductively coupled plasma (Unaxis SLR-770). The etch rate was
approximately 2 m/min using this system. This DRIE step was for
etching the uidic structures (based on the pattern transferred from
M2) to a certain depth such that the remaining depth to be etched
would complete the etching requirement of the structural patterns
on both M2 and M1 for MEFM-4. The PR on the wafer surface (covering the pattern transferred from M1) was stripped off and the
exposed silicon area was etched 300 m deep with the 2-m thick
oxide hard mask. This deep silicon etching completes the processing
of the backside of the wafer.
640
etch-through of some of the backside structures, such as the critical four ow-through holes, one inlet ow-through hole, and one
outlet ow-through hole. The PR and silicon dioxide remnants on
the wafer were nally removed using two hot PR-stripper baths
and BOE solution, respectively.
After cleaning this wafer, the next step was to cover the structured wafer on both sides with 500-m thick PyrexTM glass wafers.
Fig. 4a and b shows the structured frontside and backside of one
of the four mixing units obtainable on a wafer. Using the Stationary Sonic-Mill Process (Stationary Model AP-1000), 800-m
diameter holes were drilled through one PyrexTM wafer for uidic
access to the structured silicon wafer. Two-step anodic bonding
method was used to cover the silicon wafer with PyrexTM wafers,
which facilitates optical and uidic access into the channels of the
micromixers. Using EV 501 wafer bonder with the EV 620 contact
aligner (for aligned bonding) at CNF, the structured PyrexTM was
anodically bonded to the bottom/backside of the silicon wafer. The
anodic bonding of the second PyrexTM wafer to the top/frontside
of the silicon wafer was carried out at Applied Microengineering Ltd. (AML). The last processing step that made the MEFM-4
complete for our mixing study was dicing the bonded triple-stack
(Pyrex/silicon/Pyrex) wafer into four individual micromixers of size
35.0 mm 30.0 mm each.
3. Numerical analysis
3.1. Mixing characterization measure
Fig. 3. Schematic gures showing the fabrication steps: (a) for the backside of the
Si wafer; and (b) for the frontside of the Si wafer and anodic bonding of the wafer
with Pyrex wafers.
C(t)
C(ti )
C(t)dt
0
(1)
C(ti )ti
i=0
641
Fig. 4. Fabricated MEFM-4 (without PyrexTM covers): (a) the frontside and (b) the backside.
(2a)
t
tm
(t tm )2 E(t)t
(4)
t=0
tm
(5)
(2b)
3.2. Computational uid dynamics (CFD) simulation
tE(t)dt
tm =
(t tm )2 E(t)dt
=
=
CoV =
2
E(t)dt
E(t)dt = 1)
(since
0
t=0
( v) = 0
(6)
1
v
+ v v = p + 2 v
t
(7)
cA
+ (v. )cA = DAB 2 cA ;
t
tE(t)dt
=
tE(t)t
(3)
(8a)
where
cA = A
(8b)
642
package, was used for solid modeling of the micromixer conguration. GAMBIT preprocessor (CFD preprocessor from FLUENT )
was used for extracting the uid ow domains of the geometrical congurations and for meshing. As part of the measures to
obtain accurate solution there is need to have as many structured
elements (quadrilateral/hexahedral elements) as possible making
up the uid domain mesh and also aligning with the ow as perfectly as possible [40]. This was achieved by breaking the uid
domain into suitable sub-domains before meshing. In addition, a
mesh dependence study was carried out to determine the interval size of volume elements suitable for adequate mesh resolution
needed to obtain mesh-independent solution. Based on this study,
a mesh with 3.8 million nodes was found adequate (considering
computational expenses) and then exported from GAMBIT preprocessor to the FLUENT solver. The FLUENT segregated pressure-based
solver was used for the solution of three-dimensional uid ow
and species transport problem. The validity of the CFD code for
the simulation of RTD in microchannels has been examined by
comparing CFD simulation result in tubular microchannel with
the existing theoretical prediction [24]. In essence, the uid ow
equations and species transport equation were solved in a sequential manner using appropriate boundary conditions and numerical
algorithms.
The converged solution to steady state uid ow problem was
obtained rst. A uniform velocity prole was specied indirectly
(since density is constant) by setting the desired mass ow rate at
the inlet zone(s). The no-slip condition was specied as boundary
condition at the walls and gauge pressure of zero at the outlet zone
of the congurations. The properties specied for water (as a model
uid) were = 998.2 kg/m3 and = 1.005 106 m2 /s. In order to
obtain a stable, converged solution, certain parameters and convergence criteria such as under-relaxation factors and residuals
were set appropriately.
Using the converged solution of the steady state uid ow
equations, the tracer species equation was solved as an unsteady
simulation, whose solution was then used for RTD analysis. The
zero diffusive ux was specied as boundary condition at the walls
for the tracer species transport equation. Species mass fractions
of one (for time t = 0 at pulse injection of tracer into water for
rst time step) and switched to zero (at t > 0 after pulse injection
for the second and later time steps) were specied at the inlet
zone. The properties of water were specied for the tracer since
theoretically the tracer is taken as a water-like uid for our RTD
simulations. A mass diffusivity, DAB , of 1.5 109 m2 /s was specied for the tracer-water (AB) system. It should be noted that
discretization of the convective terms in momentum and species
transport equations (Eqs. (7) and (8a-b) above) usually introduces
an error generally referred to as numerical diffusion. This numerical error can be considerably minimized [41] by using CFD-quality
ne mesh and choosing appropriate discretization (interpolation)
schemes. Hence, Green-Gauss node based was chosen as the gradient option while the QUICK and second-order upwind schemes
in FLUENT were used as the higher order interpolation methods for
the convective terms in Eqs. (7) and (8a-b), respectively. The 2ndorder implicit unsteady formulation in FLUENT was also specied
in solving the species equation to give a more robust and accurate
solution for the unsteady state simulation. The tracer concentration
data (acquired at the outlet zone using the postprocessing component of FLUENT ) were then weighted by outlet surface area. This is
done to obtain through-the-wall (or spatial average concentration)
measurement [35], which closely represents the type of measurement obtainable at the outlet boundary of the ow/mixing system
in our tracer experiment. These weighted concentration data were
then exported into Mathematica for RTD analysis, in which tm ,
2 , and CoV were obtained and used to evaluate the degree of
mixing.
4. Experimental analysis
4.1. Setup and procedure
The schematic of the setup for our tracer experiment is shown
in Fig. 5a. The experimental setup for mixing characterization in
micromixers using RTD measure was designed such that the timedependent tracer absorbance or concentration data can be obtained
at both the inlet and outlet of ow/mixing congurations of interest.
The silicon-fabricated MEFM-4 was mounted on a stainless-steel
block/stage custom-built for pressure-driven ow access into the
mixing unit (as shown in Fig. 5b). Suitable O-rings were used for
compression seal tting after aligning the three holes (two inlet
ports and one outlet port) at the backside of the mixing unit with
the corresponding holes in the block. Two syringe pumps (from KD
Scientic) with 10-mL syringes were employed to deliver constant
ow rates of deionized water via the two inlet ports into the mixing unit. A ow ratio of 100:1 was used (same as for simulation)
at the inlets in order to make the ow system effectively one-inlet,
one-outlet system with practically zero ow disturbance. A microvolume solution of uranine (a water-soluble tracer dye also known
as uorescein sodium), was then introduced as a pulse input into
the steady state ow of water. Through a 10-mL syringe on another
syringe pump, the tracer was introduced into the main inlet stream
using a computer-controlled four-port micro-volume sample injector (from Valco Instruments Co. Inc.). The detection system (from
Ocean Optics Inc.) used comprises miniature PC2000 PC plug-in
spectrometers with two congurations, a master and a slave, for
simultaneous detection and measurement of the tracer absorbance
at both the inlet and outlet sampling zones of the ow/mixing
device. The light source (tungsten halogen lamp), ow-through
sampling cells and the spectrophotometers were connected to
interact with one another using 400-m diameter optical bers
(see Fig. 5a).
The consistency and the linearity of the calibration curves from
calibration experiments for the two sampling regions show that
the tracer concentrations at which our RTD experiments were
carried out are within the linear BeerLambert response range
for the UVvis spectrophotometers. Therefore, the obtained tracer
absorbance, which is a quantity that is proportional to tracer
concentration (i.e. C(t) = kA(t), where k is the constant of proportionality) can be used directly after normalization for RTD analysis.
Based on the calibration experiment and initial tracer experimental runs, the optimum amount and concentration of tracer for RTD
experiments were determined.
At a time, say t = 0 s, a 1.0 L of 0.5 g/L (500 ppm) uranine
solution was injected for a very short time period of 0.145 s
into the owing deionized water while simultaneously initiating data acquisition using the spectrometer operating software.
The length of the tubing connecting the injection point to the
ow/mixing system is reduced to the minimum possible so as to
minimize the axial dispersion of the pulse before reaching the inlet
detection zone. The time-dependent absorbance data were then
acquired until the measurement time reached about ve times
the estimated values of (=V/Q), the theoretical average residence
time of uid in the microchannel. The absorbancetime curves
obtained from tracer experiment should be normalized by the
area under absorbancetime curve. The normalized absorbancetime data obtained were then used as concentrationtime data
for RTD analysis. Four replicates of experiments were performed
for each ow rate investigated with our experimental setup to
establish high repeatability of data. It should be noted that the
repeatability of data obtained via tracer experiment in microscale
ow systems depends largely on the ability to perform the
experiment under carefully controlled and optimal experimental
conditions.
643
Fig. 5. (a) Schematic diagram of the experimental setup. (b) MEFM-4 device mounted on a stainless steel block/stage.
t
Cin (t t
)E(t
)dt
=
Cout (t) =
0
t
Cin (t t
)E(t
)t
(9)
were used for RTD modeling in our prior work [24]. However, the
SEM was used in the present work since it was found to model
quite well the hydrodynamic behavior of the microchannel congurations studied better than the ADM. Boskovic and Loebbecke
[18] also used SEM and found it to be superior to ADM in their
work on modeling of RTD in microchannel mixers. The RTD function
based on the SEM [42], particularly suitable for the modeling of real
ow systems with certain asymmetric residence time distribution,
is shown in Eq. (10a-b):
E()
= E(t) E(t
)
=
MNtkN
t N+1
t
tmax
N1
tkN
tN
t
tmax
N M1
(10a)
where
tk =
tmin tmax
tmax tmin
(10b)
644
Table 1
The results of the RTD analysis for CFD simulation and experiment at different ow conditions.
CFD simulation
Experiment
(s)
Re ()
Pef ()
P (Pa)
tm (s)
CoV (%)
Data points
tm (s)
CoV (%)
Data points
0.20
0.25
0.40
0.50
35.72
28.58
17.86
14.29
5.1
6.4
10.2
12.8
3420
4270
6840
8550
382
478
765
957
38.26
30.80
19.74
16.07
27.6
29.2
33.1
34.9
5857
4787
3192
2642
41.51
34.09
22.35
18.53
32.3
32.7
40.6
42.4
908
744
665
555
Fig. 6. The output concentration curves (predicted and the measured) based on SEM
for MEFM-4: (a) at 0.20 mL/min and (b) at 0.40 mL/min.
=
m
Cout
(t)
t
2
Cin (t t
)E(t
)t
(11)
In order to solve this convolution and the resulting optimization problem for large number of data points obtained from our
experiments, a code was written and implemented using some programming functions available in Mathematica 5.2 software. After
performing code validation exercises, the RTD model parameters
M and N from SEM obtained based on the model tting was then
used to determine the RTD function (E(t
) vs. t) and normalized RTD
function (E vs. ) curves.
5. Results and discussion
5.1. Tracer experiment
645
Fig. 8. The comparison of the E vs. curves for the CFD simulation and experiment at a ow rate of: (a) 0.20 mL/min; (b) 0.25 mL/min; (c) 0.40 mL/min; and (d) 0.50 mL/min.
RTDs (E vs. ) obtained for MEFM-4 at the ow rates studied are
discussed further in the next sub-section.
Based on through-the-wall measurements for the CFD simulations and experiment, the plots obtained for the normalized RTD
function (E ) as a function of dimensionless time () at the ow
rates of 0.20, 0.25, 0.40 and 0.50 mL/min for MEFM-4 are shown in
Fig. 8(a)(d), respectively. It can be seen from these gures that the
experimental normalized RTD curves are in good agreement with
the curves obtained from simulations.
Unlike a single continuous-ow stirred-tank reactor (CSTR) with
broad RTD [34], a series of identically sized (say, n) continuous-ow
stirred-tank reactors (n-CSTRs) are sometimes used to model nonideal tubular reactors so as to closely approach plug ow reactor
behavior (with narrower RTD) as n increases. In a similar manner, the proposed MEFM-4 is designed with mixing elements on
its channel oor and other mixing enhancement mechanisms to
improve ow/mixing in a way that the RTD becomes narrower. The
narrower the RTD, the closer it approaches ideal plug ow behavior.
It is not only necessary to qualitatively match the RTD curves but
to quantitatively compare the CoV values for the characterization
of the RTD.
The result of the RTD analysis for our simulation and experiment
are shown in Table 1. The moderate increase in CoV with increase
in ow rate implies a reasonable decrease in mixing performance
of MEFM-4. The same trend is obtained for both the experiment
and the simulation. Considering the operating laminar ow regime
(very low Re) in this study, the above results suggest that mixing
in MEFM-4 is being controlled by transverse (or radial) diffusion
such that mixing improves with residence time (and decrease in
Peclet number). Of course, there is optimum residence time for
646
good mixing. The real value of using CoV as a measure of mixing can be seen when different congurations are compared for
their mixing performance. In fact, it has been shown in our earlier
numerical work [20] that MEFM-4 exhibits remarkably better mixing performance than T-junction and other micromixers studied
(at same mean residence times) since its RTDs are narrower with
smaller CoV values. Caution need be exercised when interpreting
RTD data because obtaining narrow RTD does not necessarily imply
good mixing in every mixing/reaction system. However, if good
mixing is carefully designed into and optimized for a microchannel mixer or reactor, narrow RTD should be expected. The above
results show that the RTDs from CFD simulation can predict reliably
well the non-ideal ow behavior in microchannel mixers/reactors,
and can therefore be used in estimating conversion in microreactor
systems.
6. Conclusions
The mixing enhancement at low Re ow regime in a multilaminated/elongational ow micromixer (MEFM-4) was investigated
experimentally as well as numerically. The work involves the
design, numerical simulation, fabrication, and mixing characterization of this proposed multichannel micromixer. This study shows
that the design of an ideal passive micromixer or reactor should
be based on the concept of uid multilamination and elongational
ow such that high mixing performance and high throughput can
be combined with minimized pressure drop.
Tracer experiment utilizing UVvis absorption spectroscopy
detection technique was used to obtain the required concentration
data for RTD analysis. With the aim of obtaining model description of RTD in the MEFM-4 studied, a semi-empirical model (SEM)
was applied to the experimental tracer data. By performing numerical experiments using CFD tools, the laboratory acquisition of
RTD data in MEFM-4 was suitably mimicked. The obtained data
were used to determine the characteristic moments of RTD such as
mean residence time and variance (or CoV). These measures were
then used to indirectly characterize mixing behavior in MEFM-4.
The MEFM-4 shows a good mixing performance considering its
narrow RTD with the low values of CoV obtained at the operating low Re ow regime. Results of the comparison between
the normalized experimental RTDs and those from CFD simulation show good agreement at various ow rates (5 < Re < 13 in this
study). This paper also demonstrates the viability of the rapidly
developing silicon-based microfabrication technology for creating
effective microuidic mixer/reactor that can be integrated with
sensing and/or actuating functions for suitable applications in
(bio)chemical synthesis and analysis, micro total analysis systems,
and other microsystems.
Acknowledgements
The authors would like to thank The Department of EnergyIndustrial Technologies Program (DOE-ITP) and American Chemical
Society Petroleum Research Fund (ACS PRF) for the grants provided
in support of this research project. The silicon and glass microfabrication was performed in part at the Cornell NanoScale Facility
(CNF), a member of the National Nanotechnology Infrastructure
Network, which is supported by the National Science Foundation
(Grant ECS-0335765). We also gratefully acknowledge the following
individuals for their technical assistance and helpful discussions:
Meredith Metzler and Mike Skvarla (CNF), Prof. R. Besser (New Jersey Center for MicroChemical Systems NJCMCS), Dr. Dongying
Qian (formerly with NJCMCS; now with CBI Co., NJ), Nick Aitken
(Applied Microengineering Ltd., UK), and Dusan Boskovic (Fraunhofer ICT, Germany).
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Biographies
John T. Adeosun obtained his B.Sc. in Chemical Engineering (1998) from Obafemi
Awolowo University, Nigeria and his M.Eng. in Chemical Engineering (2004) from
Stevens Institute of Technology, Hoboken, New Jersey, where he would be obtaining his Ph.D. in Chemical Engineering (2009). His research interest is in the design,
fabrication, and characterization of microscale mixers/reactors using CFD, and
experimental study of the transport processes and reaction kinetics in these microchemical systems.
Adeniyi Lawal obtained his S.M. (1982) and Ph.D. (1985), both in Chemical Engineering, from Massachusetts Institute of Technology (MIT), Cambridge, and McGill
University, Canada, respectively. He is a Professor of Chemical Engineering at the
Department of Chemical Engineering and Materials Science, Stevens Institute of
Technology, Hoboken, New Jersey. His research interests are in mathematical modeling of transport processes in complex macro- and micro-geometries, and design and
demonstration of microreactor systems for on-demand, on-site chemical synthesis
and biofuel production.