OPTICAL SOLUTIONS for your Research

A Unique Optical Analysis Platform for thin film metrology

High Resolution and/or Fast Variable Angle Spectroscopic Ellipsometry Spectroscopic Scatterometry, Photometry & Reflectometry, Polarimetry Porosimetry of Thin Films and Bulk

Standard Features
Fast CCD Measurement Mode
Grating based double stage Detector: CCD array 1024 + dedicated detector for NIR Spectral range: from190 nm up to 1700 nm SE Optimized Spectrograph Resolution < 0.8 nm @ 633 nm

High Resolution Mode

Double stage spectrometer Detector: PMT in photon counting mode + dedicated detector for NIR Spectral range: from 190 nm to 2500 nm Spectrometer Scanning Resolution <0.5 nm @ 633 nm

SOPRA offers the possibility on the same platform to combine High Resolution and Multi-Channel measurements mode allowing advanced materials characterization as well as fast routine measurement with automation capabilities. Whatever your needs, your system will follow your evolution. Our SE design is based on achromatic modulation by industry proven rotating optical elements and uses patented optical fibers connection of the Spectrometers/Spectrographs. GES5E has a robust and advanced design for stable, reproducible and high accuracy measurements. No need of daily calibration.

The largest set of options

OPTICS
Spectral Extension in NIR:
Up to 2500 nm

answering user needs and metrology evolution

AUTOMATION
CCD camera monitor Variable angle measurements
Starting from 10 to 90 Up to 300 mm X-Y, Rho Theta, Combo X-Y & Theta

Automatic Microspot
Beam size down to 50 m

Achromatic Compensators fixed/scan Mueller Matrix 12 or 16 coef Polarized Photometry Scatterometry Automatic Generalized SE for Anisotropy

Mapping

Automatic tilt & Autofocus Automatic Loading

(see SE5 specs)

EXTENDED/COMBINED METROLOGY
Liquid cells Heater stage Inert gas cell
(4.2 K-700 K) measurements up to 5 spectra/sec

EPA thin film Porosimetry

(see EPA brochure) @ 0.154 nm up to 33 m

X-Ray Reflectometry/GXR/XRD Infra Red SE by FTIR Spectroscopic Reflectometer

300-1700 nm

Cryostat

In-Situ and Real-time SE

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OPTICAL SOLUTIONS for your Research

Softwares
GES5 E completely benefits from redesigned software interface, with deepest hardware control allowing user to manage and use every optical elements independently, or to customize new sequences to achieve a specific measurement like optical retardance and generalized ellipsometry. GES5 E also benefits from the most recent algorithms for fast convergence. Library of dispersion laws can be added without limitation and (n,k) database has more than 1000 entries.

WINSE automated calibration, measurement, analysis Software

Derivated from our stable and robust production software engine, the software run under Windows XP. Push button Operator and Engineer mode architecture Full hardware sequence management and I/O inputs Regression and extraction of physical parameters (Thickness, Optical constants, R%, T%, Optical roughness, Sheet resistance, Concentration, Dopants) EMA, Alloy, Large range of models The largest n,k database available

WinElli2 Advanced Research Software

Full Simulation for Isotropic, Anisotropic, graded profile, interface, periodic layer system in Angular Ellipsometry, Spectroscopic Ellipsometry, Photometry, Reflectometry, Scatterometry, Porosimetry Generalized SE and Mueller matrice data handling Largest range of models and n,k for analysis.

Performance
Measuring time: sec (Fast CCD mode) 1 sec (High Resolution mode 120 Thickness range 0.01nm to 50m Measurement Precision: 0.01nm on 120nm ref sample Optical indexes with 10-3 precision

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OPTICAL SOLUTIONS for your Research

Typical Applications
As a pioneer in the SE technology SOPRA provides the widest proprietary n & k database
Semiconductors
High-k: SiO2 , Si3N 4 , SiNx, SiON, HfO2, Ta 2O5 , ZrO2 ... Low-k: SiOC, SiOF, SOG, Polymers... Metals & interconnects: Al, Cu, Cr, Mo, W, Pt, TiN, TaN, WSix, AlCu Lithography: AR coatings, BARC, SiO xN y, Resists, Masks... Semiconductors & Epi-layers: SOI, SiGe, Strained Si, SiC, Poly-Si, a-Si, OPO, ONO, HSG, III-V: AsGa,InP,GaN, II-VI: CdTe, ZnSe...
N
Si cap thickness Native oxide Silicon SiGe (9%) Silicon SiGe tickness Ge% in SiGe layer

Flat Panel Displays

TFT-LCDs: SiO x, SiNx, a-Si:H, N+a-Si, Photo Resists, ITO, Polymide ...
K

LTPS: poly-Si, crystallinity, H content in a-SiH, SiO2, ... Colour filters: RGB, Polymide, ITO, CrO 2, Cell Gap, LC... OLED: AlQ3, CuPc, doped organics layers, thin metals... STN: thin polymers, Polymides, ITO ...
WaveL(nm)

PDPs: Enamel, MgO, ITO, Al2O 3 ...

OLED: refractive indices of HTL for various doping levels

Photonics
Waveguides, coarse filters, Reflective Coatings, ARC III-V devices (EEL, VCSEL, ECL) MEMS, AlGaN, GaN Sol-Gel/Porous

General
Ferroelectric materials (BST, SBT, PZT) CD-RW (AgInSbTe, ZnS,, SiO 2) Magnetic Films (GMR, thin film heads) CNT/Nanodots/rods Fuel, SOFC, porous electrode

Organics
Photovoltaic, DSSC, ZnO, CIS Langmuir Blodgett films Bio-sensors Polymers dyes Porous materials

SOPRA Application Laboratory continuously supports its customers through sample characterization and data analysis assistance. SOPRA is following the procedures recommended by International Standards Organization applying a calibration process to every Reference Sample.

Dimensions (in mm) with optional Frame

336,5

639

766

1202 750 890

SOPRA USA Tel.: +1 650 566 1270 - Fax: +1 650 566 1267 sales@soprainc.com

SOPRA France Tel.: +33 1 46 49 67 00 - Fax: +33 1 42 42 29 34 sales@sopra-sa.com

SEIKA Corp. Japan Tel.: +81 3 52 21 71 18 - Fax: +81 3 52 21 71 35 moss@jp.seika.com

Non-contractual document. SOPRA may modify the products/specifications described in this document or any documents supplied with the product without prior notice

SiGe: Thickness mapping in CCD mode with Si Cap, SiGe thickness and Ge%