The world's creating extremely fine patterns (much
smaller than can be seen by the naked eye) smallest guitar is 10 micrometers long-- required by the modern electronics about the size of single human cells. While industry for integrated circuits. Derived the strings as long as 50 nanometers, from the early scanning-electron or 100 atom wide. microscopes, the technique consists of Created by researchers at Cornell scanning a beam of electrons across a University, U.S. from crystalline silicon,it surface covered with a thin film, called a demonstrates a new generation of musical resist. The electrons produce a chemical instruments in the world. However, this change in this resist, which allows the tool can only be played with special surface to be patterned. microscopic equipment and his tone was not likely to be Using high-voltage electron heard by ordinaryears. beam lithography at the Cornell Nanofabrication Facility, one of only two similar machines in this country, the structures were sculpted out of single crystal silicon on oxide substrates. A resist is used to pattern the top silicon layer. The oxide that is underneath this layer can be selectively removed using a wet chemichal etc.The result is free-standing structures in A scanning electron microscope photo of the nano silicon crystal. guitar
The Cornell Nanofabrication Source from : translate.google.com and
Facility (CNF) at Cornell University, is http://www.musicgadgets.net/2006/09/19/nanoguitar partially supported by the National Science -the-smallest-guitar-in-the-world. Foundation. It is part of the National Aanning electron microscope photo of the nano Nanofabrication Users Network, a guitar partnership of nanotechnology centers across the nation. In addition, this research Using high-voltage electron beam lithography at the Cornell Nanofabrication Facility, one of was funded partially by the U.S. only two similar machines in this country, the Department of Defense and the structures were sculpted out of single crystal Department of Education. silicon on oxide substrates. A resist is used to pattern the top silicon layer. The oxide that is under